Pattern Image ROI Determination for Critical Dimension Measurement

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Solution Overview

Problem

Conventional methods for measuring critical dimensions of patterns, especially fine or complex patterns in semiconductor manufacturing, face challenges in accurately and rapidly determining the region of interest (ROI), requiring skill and experience.

Innovation Solution

A method and apparatus that automatically determine the ROI by matching real and design pattern images to find the optimum turning points along the pattern contour, setting a region of interest within a predetermined range, and measuring the critical dimension within this region, improving precision and reproducibility.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Extent of automation

If conventional manual methods are used to determine ROI, then measurement can be performed, but the process requires skill and experience and is time-consuming

Engineering Contradiction:
ImproveROI determination automationVSAvoidTime for ROI determination
Core Design Contradiction:
Extent of automationVSLoss of time

Solution Approach 1:

The system automatically determines the ROI by processing the pattern image itself through image processing algorithms, without requiring manual intervention or expert skill. The algorithm independently identifies the region of interest based on pattern characteristics, enabling the system to serve itself rather than requiring human expertise for each measurement.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system performs preliminary image processing and analysis to automatically identify and determine the ROI before the actual measurement is performed. By pre-processing the image to extract relevant features and determine the region of interest in advance, the system eliminates the need for manual ROI selection and reduces measurement time.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If manual ROI determination is used, then flexibility is maintained, but measurement precision and reproducibility are compromised

Engineering Contradiction:
ImproveCritical dimension measurement precisionVSAvoidOperational simplicity
Core Design Contradiction:
Measurement precisionVSEase of operation

Solution Approach 1:

The patent replaces manual mechanical selection of ROI with automated image processing algorithms. The system uses computational methods to automatically identify and measure the region of interest, substituting human judgment and manual operations with automated digital processing, thereby improving precision and reproducibility while maintaining ease of operation through automated functionality.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If conventional measurement methods are used, then simple operation is maintained, but measurement speed and efficiency are reduced

Engineering Contradiction:
ImproveMeasurement speedVSAvoidMeasurement system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The system creates a digital copy or representation of the pattern image and processes this digital replica to automatically determine the ROI and perform measurements. By working with a digital copy rather than physically manipulating the actual pattern, the system enables rapid automated measurement while keeping the physical measurement system relatively simple.

Inventive Principle:
Principle #26Copying

Data Source

PatentUS8988521B2Method of measuring critical dimension of pattern and apparatus for performing the same
Publication Date: 2015.03.24 SAMSUNG ELECTRONICS CO LTD
  • US8988521B2 patent drawing
  • US8988521B2 patent drawing
  • US8988521B2 patent drawing

AI summary

In a method of measuring a critical dimension of a pattern, a pattern image is obtained from an object pattern. A design pattern of the object pattern and the pattern image are matched to determine a detection region on the pattern image. An optimum turning point of the pattern contour is determined in the detection region and a ROI (region of interest) is set within a predetermined range from the optimum turning point. A critical dimension of the pattern is measured in the ROI.