Pattern Laminate with High Tg First Layer for Imprint Lithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for producing pattern laminates in imprint lithography face challenges in forming reliable reversal patterns due to deformation and increased etching roughness, particularly with photocurable compositions, where the glass transition temperature of the first layer is too low, leading to mixing with the second layer and reduced etching selectivity.
Innovation Solution
A method involving a pattern laminate with a first layer having a glass transition temperature of 90° C. or higher, formed using a photocurable composition with specific polymerizable compounds and a viscosity of less than 10 mPa·s, and a second layer with etching selectivity, where the second layer is thinned to expose the first layer pattern for selective etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a photocurable composition with low glass transition temperature is used for the first layer, then the composition is easy to process and form patterns, but the first layer mixes with the second layer during etching, reducing etching selectivity and increasing pattern deformation
Solution Approach 1:
The patent changes the glass transition temperature parameter of the photocurable composition from below room temperature to 90°C or higher. This parameter change fundamentally alters the thermal behavior of the first layer, preventing it from softening and mixing with the second layer during the etching process, thereby maintaining etching selectivity while preserving pattern formation capability
Solution Approach 2:
The patent creates a composite material system where the photocurable composition is formulated with specific polymerizable compounds (acrylic acid, methacrylic acid, and their esters) to achieve both the high glass transition temperature and the necessary patternability. This composite approach allows simultaneous optimization of thermal stability and pattern formation properties
2Reliability
If the glass transition temperature of the first layer is increased to prevent mixing, then etching selectivity is improved, but the composition becomes more difficult to process
Solution Approach 1:
The patent carefully selects specific polymerizable compounds with particular molecular structures and ratios to achieve the target glass transition temperature of 90°C or higher. By controlling the composition parameters (specifically using acrylic acid, methacrylic acid, and their ester compounds in defined proportions), the material maintains processability despite the high glass transition temperature
Solution Approach 2:
The patent optimizes the local chemical composition of the photocurable material by selecting specific functional groups and molecular structures that provide both high glass transition temperature and adequate fluidity for pattern formation. The local quality of the polymer chains is engineered to balance thermal stability with processing characteristics
3Device complexity
If conventional photocurable compositions are used, then the manufacturing process is simple, but waviness after etching (ΔLWR) increases and reversal pattern formation becomes unreliable
Solution Approach 1:
The patent modifies the chemical composition parameters of the photocurable material to achieve a glass transition temperature of 90°C or higher. This parameter change prevents pattern deformation during etching, significantly reducing waviness after etching (ΔLWR) and enabling reliable reversal pattern formation while maintaining process simplicity
Solution Approach 2:
The patent uses a photocurable composition that can be easily applied and cured through standard imprint lithography processes, replacing complex multi-step patterning methods. The composition is designed to be consumed in the imprint process, forming the first layer pattern that enables subsequent high-precision etching without requiring expensive or complex equipment modifications
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces waviness after etching (ΔLWR) and enhances the reliability of forming reversal patterns with improved etching selectivity and reduced defects, allowing for precise processing of fine patterns.
Implementation Method 1
a first layer having a pattern on an object to be processed... formed using a photocurable composition
Data Source
AI summary
Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (ΔLWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.