Pattern Matching Template Generation Without Exposure Simulation
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Solution Overview
Problem
Existing methods for creating pattern matching templates from design data in semiconductor devices require complex exposure simulations and significant effort, failing to efficiently accommodate size changes due to pattern exposure conditions.
Innovation Solution
A method and device that shrink or enlarge design data based on desired pattern size, and perform pattern corner rounding, allowing for template creation without exposure simulations, thereby forming images that match actual patterns with ease.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If exposure simulation is performed to create accurate pattern matching templates, then manufacturing precision is improved, but productivity deteriorates due to considerable time and effort requirements
Solution Approach 1:
The patent creates template images by directly copying and processing design data (GDS files) without performing exposure simulations. The design data is read, binarized, and processed to generate template images that can be used for pattern matching, eliminating the time-consuming simulation step while maintaining sufficient accuracy for template creation purposes.
Solution Approach 2:
The patent extracts only the essential information needed for template creation from the design data, separating it from the complex exposure simulation process. By reading design data directly and performing only necessary processing (binarization, contour extraction), it takes out the core template creation function from the simulation workflow, significantly reducing time requirements.
2Manufacturing precision
If numerous simulation conditions are set up to improve template precision, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent copies design data directly to create templates, avoiding the complex simulation setup entirely. By using design data as the direct source for template images, it eliminates the need to configure numerous simulation parameters, exposure conditions, and material properties, thereby reducing device complexity while maintaining template creation capability.
3Ease of manufacture
If design data is used directly without size adjustment, then ease of manufacture is improved, but manufacturing precision deteriorates due to inability to accommodate pattern size changes
Solution Approach 1:
The patent changes the size parameter of design data by applying scaling transformations based on measured actual pattern dimensions. After reading design data and binarizing it, the system calculates the ratio between design pattern size and actual measured pattern size, then applies this scaling factor to adjust the template image size, thereby accommodating pattern size changes while maintaining ease of template creation from design data.
Data Source
AI summary
The present invention is a device that creates a template based on design data without performing an exposure simulation, etc., and an object thereof is to provide a pattern matching image forming device capable of forming an image that is commensurate with the size of the actual pattern. As one mode for achieving the object above, there is proposed a pattern matching image forming device that, in forming a matching image, shrinks or enlarges design data based on a desired pattern size, and that forms a matching image based on a pattern thus shrunk or enlarged.