Patterned Conductive Film Laser Patterning
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Solution Overview
Problem
Current methods for patterning silver nanowire films, such as photolithography, result in visible etching marks and environmental pollution due to chemical usage, and are costly, while also failing to achieve high conductivity ratios between patterned and non-patterned regions effectively.
Innovation Solution
A patterned conductive film with a conductive interconnected nano-structure film and a patterned regulating layer, where the film is treated with energy sources like heat, light, or plasma to create regions with significantly different conductivities, eliminating the need for chemical etching and reducing visible marks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If common photolithography process is used for patterning silver nanowire film, then pattern can be formed, but visible etching marks are left and optical quality deteriorates
Solution Approach 1:
The patent extracts and removes the harmful chemical etching process from the patterning method. Instead of using chemical etchants that leave visible marks and damage optical quality, the invention uses a physical method (laser irradiation) to pattern the silver nanowire film, completely eliminating the etching step and its associated harmful effects while maintaining patterning precision.
Solution Approach 2:
The patent replaces the chemical-based photolithography system with a physical laser-based system. The chemical etching process is substituted by laser irradiation that selectively removes or modifies silver nanowires in targeted areas without requiring chemical developers or etchants, thereby preventing visible etching marks and preserving optical quality.
2Manufacturing precision
If common photolithography process is used for patterning, then pattern can be formed, but fabrication cost increases due to chemical usage
Solution Approach 1:
The patent extracts and eliminates the expensive chemical processing steps (etching, rinsing, drying) from the photolithography process. By using direct laser irradiation to pattern the silver nanowire film, the invention removes the need for chemical etchants, developers, and associated washing/drying processes, significantly reducing material costs and simplifying the manufacturing workflow while maintaining patterning precision.
Solution Approach 2:
The patent substitutes the complex chemical processing system with a simpler physical laser system. The multi-step chemical process (coating, exposing, developing, etching, rinsing, drying) is replaced by a direct laser writing or irradiation process that patterns the film in fewer steps, reducing both material consumption and processing time, thereby lowering fabrication costs.
3Manufacturing precision
If common photolithography process is used for patterning, then pattern can be formed, but environmental pollution occurs due to chemical waste
Solution Approach 1:
The patent extracts and completely removes the chemical waste-generating steps from the patterning process. By using laser irradiation to directly pattern the silver nanowire film without chemical etchants or developers, the invention eliminates the production of hazardous chemical waste that would require special disposal procedures, thereby preventing environmental pollution while maintaining patterning precision.
Solution Approach 2:
The patent replaces the chemical-intensive photolithography system with a clean physical laser system. The substitution eliminates all chemical reagents and their associated waste streams (etched material, developer waste, rinse water contamination), creating an environmentally friendly manufacturing process that achieves the same patterning precision without generating harmful environmental factors.
4Object-affected harmful factors
If conductivity regulating treatment is applied to create high conductivity ratio, then optical quality improves by eliminating etching marks, but process complexity increases
Solution Approach 1:
The patent extracts and eliminates the complex multi-step chemical etching process that creates visible marks and requires multiple processing stages. Instead, it uses a single-step or fewer-step laser irradiation process to achieve both patterning and the desired conductivity ratio, simplifying the overall process while improving optical quality by eliminating etching marks entirely.
Solution Approach 2:
The patent substitutes the complex chemical etching and patterning system with a simpler laser-based system. The laser process simultaneously achieves pattern formation and conductivity modulation in one step, replacing the sequential chemical processes (exposure, development, etching, rinsing, drying) with a direct physical modification method that reduces process complexity while enhancing optical quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves high conductivity ratios without visible etching marks and chemical usage, improving optical quality and reducing environmental impact while lowering fabrication costs.
Implementation Method 1
An energy source is provided to perform a conductivity regulating treatment to the conductive interconnected nano-structure film and the patterned regulating layer
Data Source
AI summary
Provided is a patterned conductive film may include a conductive interconnected nano-structure film. The conductive interconnected nano-structure film may include a first region and a second region adjacent to the first region. A conductivity of the first region may be at least 1000 times a conductivity of the second region.