Patterned Transparent Conductive Layer for Electrochromic Switching
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Solution Overview
Problem
Current electrochromic devices face challenges in achieving faster and more homogeneous switching speeds during manufacturing while maintaining throughput, as existing transparent conductive layers do not efficiently manage resistance variations across the device.
Innovation Solution
The method involves depositing a patterned transparent conductive layer using a short pulse laser to alter resistivity without removing material, creating regions with different resistivities within the layer, which improves switching uniformity and reduces manufacturing costs by patterning after all layers are deposited.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a uniform transparent conductive layer is used, then manufacturing is simple, but switching speed and uniformity are poor due to resistance variations across the device
Solution Approach 1:
The patent applies local quality by creating regions of different resistivity within the transparent conductive layer. Specifically, it forms a first region with higher resistivity and a second region with lower resistivity, allowing different areas of the device to have optimized electrical properties for their specific functional requirements, thereby achieving uniform switching performance across the entire device.
Solution Approach 2:
The patent segments the transparent conductive layer into distinct regions with different resistivity characteristics. By dividing the layer into a first region and a second region with different electrical properties, it enables independent optimization of different device areas, resolving the contradiction between manufacturing simplicity and switching uniformity.
2Manufacturing precision
If material is removed to pattern the conductive layer, then resistance control is improved, but manufacturing complexity and cost increase
Solution Approach 1:
The patent changes the resistivity parameter of the transparent conductive layer in different regions without removing material. By adjusting the resistivity of specific regions (creating high-resistivity and low-resistivity areas), it achieves precise resistance control while avoiding complex patterning processes such as etching or material removal.
Solution Approach 2:
Instead of the conventional approach of removing material to create patterns, the patent inverts the approach by modifying the electrical properties of the material in situ. Rather than cutting or etching the conductive layer, it changes the resistivity of different regions, achieving patterning effects through property modification rather than material removal.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in a more uniform and faster transition from clear to colored states, with a significant reduction in center-to-edge resistance differences, enhancing holding uniformity and performance in larger devices.
Implementation Method 1
depositing a patterned transparent conductive layer using a short pulse laser to alter resistivity without removing material
Implementation Method 2
Electrochromic (EC) devices employ materials capable of reversibly altering their optical properties following electrochemical oxidation and reduction in response to an applied potential
Data Source
AI summary
An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparent conductive layer overlying the anodic electrochemical layer. The method can include depositing an insulating layer over the stack and determining a first pattern for the second transparent conductive layer. The first pattern can include a first region and a second region. The first region and the second region can be the same material. The method can include patterning the first region of the second transparent conductive layer without removing the material from the first region. The first region can have a first resistivity and the second region can have a second resistivity.