Patterned Film Surface Recovery After Plasma or UV/Ozone Cleaning

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

UV/ozone cleaning or oxygen plasma cleaning of substrates with patterned films reduces the lyophobicity of the bank surface, leading to ink intrusion into recesses during ink-jet methods, as the cleaning processes lower the hydrophobicity of the bank surface.

Innovation Solution

A method involving a specific fluorine-containing copolymer in the patterned film, where UV/ozone cleaning or oxygen plasma cleaning is followed by a heating treatment to recover the lyophobicity of the film, maintaining sufficient lyophobicity while preserving the lyophilicity of the substrate surface.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Difficulty of detecting and measuring

If UV/ozone cleaning or oxygen plasma cleaning is performed on the substrate with patterned film, then the lyophilicity of the substrate surface (recess) is improved, but the lyophobicity of the bank surface deteriorates

Engineering Contradiction:
Improvelyophilicity of substrate surfaceVSAvoidlyophobicity of bank surface
Core Design Contradiction:
Difficulty of detecting and measuringVSReliability

Solution Approach 1:

The patterned film is designed to contain a fluorine-containing copolymer that will undergo lyophobicity recovery when heated. This preliminary design ensures that after cleaning reduces lyophobicity, subsequent heating automatically restores it, preventing ink intrusion before the ink-jet process begins

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The lyophobicity of the bank surface is controlled by changing the temperature parameter. Heating the substrate at 50-350°C restores the lyophobicity of the fluorine-containing copolymer, thereby controlling the surface properties to prevent ink intrusion while maintaining cleaning effectiveness

Inventive Principle:
Principle #35Parameter changes

2Reliability

If heating treatment is applied to recover lyophobicity, then the lyophobicity of the patterned film is improved, but energy consumption increases

Engineering Contradiction:
Improvelyophobicity of patterned filmVSAvoidenergy consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The heating temperature range is optimized to 50-350°C, balancing the recovery of lyophobicity with reasonable energy consumption. This parameter optimization ensures sufficient lyophobicity restoration without excessive energy use

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The fluorine-containing copolymer inherently possesses the ability to recover its lyophobicity when heated, without requiring additional chemical treatments or complex processing steps. The material self-restores its protective property through simple thermal energy input

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively recovers the lyophobicity of the patterned film after cleaning, preventing ink intrusion and ensuring accurate ink placement during ink-jet methods, as demonstrated by significant contact angle recoveries with various solvents.

Implementation Method 1

UV/ozone cleaning

Methodology Applied
Scientific EffectPhoto-oxidation: Photo-oxidation

Implementation Method 2

UV/ozone cleaning or oxygen plasma cleaning

Methodology Applied
Scientific EffectOxidation: Oxidation

Implementation Method 3

oxygen plasma cleaning

Methodology Applied
Scientific EffectPlasma: Plasma

Implementation Method 4

oxygen plasma cleaning

Methodology Applied
Scientific EffectOxidation: Oxidation

Implementation Method 5

heating treatment performed thereafter provides the lyophobicity

Methodology Applied
Scientific EffectHeating: Heating

Data Source

PatentUS20240319606A1Method for producing substrate with patterned film
Publication Date: 2024.09.26 CENT GLASS CO LTD
  • US20240319606A1 patent drawing
  • US20240319606A1 patent drawing
  • US20240319606A1 patent drawing

AI summary

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.