Patterned Filter Membranes for Uniform Nanopore Filtration
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current point-of-use filters in semiconductor manufacturing often have randomly sized pores, leading to inefficiencies in removing particles as small as 0.1 micrometers, which can cause defects in integrated circuit production, and may allow larger particles to pass through, compromising the semiconductive nature of silicon wafers.
Innovation Solution
Development of filter membranes with uniformly sized through holes, ranging from 5 nm to 50 nm in diameter, arranged in specific patterns, and made from materials like fluorocarbon polymers, to effectively capture particles while maintaining fluid flow, using techniques such as nano-imprint lithography, laser patterning, and plasma etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If filter membranes with randomly sized pores are used, then the device complexity is reduced and ease of manufacture is improved, but the manufacturing precision and particle removal efficiency deteriorate
Solution Approach 1:
The patent applies preliminary action by forming a patterned layer with predetermined hole patterns before creating the final filter membrane. This preliminary patterned layer serves as a template that ensures uniform pore sizes in the final product, resolving the contradiction between ease of manufacture and manufacturing precision by establishing size uniformity before the filtering function is implemented
Solution Approach 2:
The patent introduces an intermediary patterned layer that acts as a template between the manufacturing process and the final filter membrane. This intermediary layer with its predetermined hole pattern transfers the uniformity requirement to the final filter membrane, enabling precise pore size control without complicating the overall manufacturing process
2Manufacturing precision
If filter membranes with uniformly sized through holes are used, then the particle capture rate is improved and manufacturing precision is enhanced, but the device complexity increases
Solution Approach 1:
The patent applies segmentation by dividing the filter membrane into multiple functional layers: a base layer and a patterned layer with through holes. This segmentation allows the uniform pore size function to be achieved in the patterned layer while the base layer provides structural support, thereby reducing overall device complexity while maintaining manufacturing precision
Solution Approach 2:
The patent utilizes porous materials by creating a filter membrane with controlled porosity through the patterned layer. The uniform through holes in the patterned layer provide precise pore size control, while the porous structure itself simplifies the design by relying on the natural filtering capability of the material architecture rather than complex mechanical components
3Reliability
If smaller pore sizes (5 nm to 50 nm) are used to capture smaller particles, then the particle capture rate for sub-micrometer particles is improved, but the fluid flow resistance increases
Solution Approach 1:
The patent applies local quality by creating regions of uniform, small pore sizes (5 nm to 50 nm) specifically in the patterned layer where particle capture is critical, while the overall filter membrane maintains sufficient open area through the ordered arrangement of holes. This localized precision in critical areas achieves high particle capture rates without excessively restricting overall fluid flow
4Reliability
If point-of-use filters are designed to remove particles as small as 0.1 micrometers, then the reliability of semiconductor production is improved, but the productivity decreases due to increased filtration resistance
Solution Approach 1:
The patent replaces a purely mechanical filtration approach with a structured, patterned approach where holes are arranged in specific patterns (such as hexagonal or square lattices). This geometric organization optimizes the balance between particle capture and fluid flow, maintaining productivity while achieving the reliability needed for removing 0.1 micrometer particles
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The uniform pore size and patterned arrangement of the filter membranes enhance particle capture rates and prevent defects in semiconductor production by ensuring that particles are effectively removed, improving the yield and reliability of integrated circuits.
Implementation Method 1
Filters, in particular, point-of-use (POU) filters, are designed to remove contaminants or particles from the liquids, solutions, and/or solvents used in semiconductor integrated circuit manufacturing processes
Implementation Method 2
using techniques such as nano-imprint lithography, laser patterning, and plasma etching
Implementation Method 3
using techniques such as nano-imprint lithography, laser patterning, and plasma etching
Data Source
AI summary
A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.