Patterned Media Zone Patterning Masking
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Solution Overview
Problem
Current bit-patterned media (BPM) fabrication technologies face challenges in achieving high areal density patterns efficiently, particularly in protecting servo and data zones during patterning processes to prevent defects and enhance throughput.
Innovation Solution
The method involves using a first and second mask to protect respective zones during patterning, allowing for the application of block copolymer directed self-assembly processes to increase areal density in both data and servo zones, with specific techniques like optical lithography and etching to transfer patterns into substrates, achieving areal densities greater than 1.5 Tdpsi.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single patterning process is used for both servo and data zones, then the manufacturing process is simpler and faster, but the patterning precision and defect control deteriorate due to interference between zones
Solution Approach 1:
The patent divides the patterning process into two separate sequential steps: first patterning the servo zone with a protective mask on the data zone, then patterning the data zone with a protective mask on the servo zone. This segmentation allows each zone to be patterned with optimal precision without interference from the other zone, resolving the contradiction between throughput and precision.
2Manufacturing precision
If masks are used to protect zones during patterning, then patterning precision improves, but device complexity and process steps increase
Solution Approach 1:
The patent applies protective masks to the zones that will not be patterned in each step before the patterning process begins. This preliminary protective action prevents unwanted exposure and defects, enabling high precision patterning while managing complexity through systematic preparation.
3Quantity of substance
If high areal density patterns are created, then storage capacity increases, but defect rates increase due to process challenges
Solution Approach 1:
The patent applies different patterning conditions and protective measures to different zones (servo vs. data) based on their specific requirements. The servo zone receives protection during data zone patterning and vice versa, allowing each zone to achieve optimal pattern quality and density while minimizing defects through zone-specific quality control.
Data Source
AI summary
Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.