Patterned Substrate for Nitride Semiconductor Light Extraction

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Solution Overview

Problem

Conventional semiconductor light emitting devices face challenges in maximizing light extraction efficiency due to total internal reflection and limited surface area of the active layer, leading to suboptimal quantum efficiency.

Innovation Solution

A semiconductor light emitting device with a patterned substrate featuring locally irregular convex portions of varying shapes and sizes, which changes the growth mode of nitride semiconductors to increase the surface area of the active layer and enhance light extraction efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a flat substrate is used, then the manufacturing process is simple, but the light extraction efficiency is low due to total internal reflection

Engineering Contradiction:
Improvesubstrate manufacturing simplicityVSAvoidlight extraction efficiency
Core Design Contradiction:
Ease of manufactureVSLoss of energy

Solution Approach 1:

The patent applies curvature by forming convex portions on the substrate surface instead of using a flat surface. These convex portions have curved surfaces that change the incident angles of light, enabling light extraction even when the incident angle exceeds the critical angle for total internal reflection. This resolves the contradiction by maintaining manufacturing simplicity while significantly improving light extraction efficiency through geometric curvature modification.

Inventive Principle:
Principle #14Spheroidality (Curvature)

2Ease of manufacture

If a regular pattern is formed on the substrate, then the manufacturing process is straightforward, but the nitride semiconductor growth is non-uniform leading to manufacturing difficulties

Engineering Contradiction:
Improvepattern formation simplicityVSAvoidnitride semiconductor growth uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies local quality by making the convex portions have different sizes, shapes, and spacing arrangements rather than using a uniform regular pattern. This local variation in pattern characteristics allows different regions of the substrate to provide optimal growth conditions for nitride semiconductor formation, achieving uniform and high-quality semiconductor growth while maintaining pattern formation simplicity.

Inventive Principle:
Principle #3Local quality

3Loss of energy

If the active layer surface area is increased, then the internal quantum efficiency is enhanced, but the device structure becomes more complex

Engineering Contradiction:
Improveinternal quantum efficiencyVSAvoiddevice structure complexity
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent applies dimensionality change by transitioning from a two-dimensional flat active layer to a three-dimensional structure with convex portions. This vertical dimensionality addition increases the effective surface area of the active layer without requiring lateral expansion, thereby enhancing internal quantum efficiency while avoiding increased device footprint and structural complexity.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The patterned substrate design increases internal and external quantum efficiency by altering the growth mode and light extraction pathways, resulting in improved optical output and efficiency.

Implementation Method 1

nitride semiconductors begin to grow from a flat surface of the square convex portions and a bottom surface of the substrate

Methodology Applied
Scientific EffectEpitaxial growth: Epitaxy

Implementation Method 2

light generated from the nitride light emitting device, when having an incident angle greater than a critical angle due to differences in refractivity, undergoes total internal reflection and thus cannot be extracted outward

Methodology Applied
Scientific EffectTotal internal reflection: Total Internal Reflection

Data Source

PatentUS8372669B2Semiconductor light emitting device having patterned substrate and manufacturing method of the same
Publication Date: 2013.02.12 SAMSUNG ELECTRONICS CO LTD
  • US8372669B2 patent drawing
  • US8372669B2 patent drawing
  • US8372669B2 patent drawing

AI summary

There is provided a semiconductor light emitting device having a patterned substrate and a manufacturing method of the same. The semiconductor light emitting device includes a substrate; a first conductivity type nitride semiconductor layer, an active layer and a second conductivity type nitride semiconductor layer sequentially formed on the substrate, wherein the substrate is provided on a surface thereof with a pattern having a plurality of convex portions, wherein out of the plurality of convex portions of the pattern, a distance between a first convex portion and an adjacent one of the convex portions is different from a distance between a second convex portion and an adjacent one of the convex portions.