Patterning Clusters Coloring Uniformity Hierarchical Cells

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Solution Overview

Problem

Conventional double-patterning techniques often assign different coloring arrangements to instances of hierarchical cells in layout design data, leading to non-uniformity and potential conflicts in microdevice manufacturing, which can result in manufacturing challenges due to the close spacing of microdevice structures.

Innovation Solution

The technology seeds layout design data with sampling markers to determine patterning scores for patterning clusters, allowing for the application of coloring arrangements that maintain uniformity across multiple instances of hierarchical cells, thereby preserving the hierarchical information and ensuring consistent operating characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional double-patterning techniques are used to handle closely spaced microdevice structures, then manufacturing capability is improved, but coloring uniformity across hierarchical cell instances deteriorates

Engineering Contradiction:
Improvecoloring uniformityVSAvoidhierarchical structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The layout design data is divided into patterning clusters that are processed independently. Each cluster is evaluated separately using sampling markers and patterning scores, allowing uniform coloring to be applied to each instance of hierarchical cells while maintaining the overall hierarchical structure. This segmentation enables consistent coloring across multiple instances without requiring complex global coordination.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Sampling markers are placed in advance within hierarchical cells before the actual patterning process. These markers serve as reference points that determine the coloring arrangement for entire instances of the hierarchical cell. By performing this preliminary action, the patent ensures that all instances receive consistent coloring without needing to process each instance individually during the main patterning workflow.

Inventive Principle:
Principle #10Preliminary action

2Loss of information

If hierarchical information is preserved in layout design data, then design clarity is improved, but consistent coloring application across instances becomes more difficult

Engineering Contradiction:
Improvehierarchical information preservationVSAvoidcoloring application ease
Core Design Contradiction:
Loss of informationVSEase of manufacture

Solution Approach 1:

Sampling markers act as intermediaries between the hierarchical structure and the coloring process. These markers are placed within the hierarchical cell definition and automatically replicated to all instances. The markers serve as the connecting element that allows the coloring tool to apply consistent coloring across all instances while the hierarchical information remains intact and未被 disrupted.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The coloring arrangement determined from sampling markers in one instance is copied to all other instances of the same hierarchical cell. This copying mechanism ensures uniformity across instances without requiring the coloring process to understand or manipulate the hierarchical structure directly, thus maintaining both hierarchical information and coloring consistency.

Inventive Principle:
Principle #26Copying

Data Source

PatentUS10311197B2Preserving hierarchy and coloring uniformity in multi-patterning layout design
Publication Date: 2019.06.04 SIEMENS INDUSTRY SOFTWARE INC
  • US10311197B2 patent drawing
  • US10311197B2 patent drawing
  • US10311197B2 patent drawing

AI summary

Layout design data is seeded with sampling markers. The sampling markers are used to determine patterning scores for patterning clusters in the layout design data, such that a patterning score corresponds to a particular coloring arrangement, and the value of a patterning score corresponds to how many of the sampling markers have a given color. Coloring arrangements are then applied to the patterning clusters based upon the patterning scores.