Patterning Coating for Selective Vapor Deposition in Opto-Electronics
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Solution Overview
Problem
Existing opto-electronic devices, such as OLEDs, face challenges in achieving precise control over the deposition of conductive layers, particularly in transmissive regions, which affects their optical properties, performance, stability, reliability, and lifetime.
Innovation Solution
A layered semiconductor device is developed, featuring a patterning coating with a specific combination of materials that impacts the propensity of a vapor flux to condense, allowing for selective deposition of a conductive layer. This coating is applied in a first portion of the device, while a closed coating of the deposited material is formed in a second portion, creating a discontinuous layer in the first portion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single material patterning coating is used, then the coating can be simplified in composition, but it cannot achieve certain combinations of material properties required for precise deposition control
Solution Approach 1:
The patent applies composite materials by combining multiple patterning materials (organic material, inorganic material, or polymer material) in a single patterning coating layer. This composite approach enables the coating to achieve specific combinations of material properties that cannot be obtained with a single material, thereby improving deposition control precision while managing composition complexity through systematic material selection.
2Manufacturing precision
If a patterning coating comprising multiple materials is used, then precise control over deposition of conductive layers is achieved, but the coating formulation becomes more complex
Solution Approach 1:
The patent employs parameter changes by systematically varying the composition, thickness, and material properties of the patterning coating to optimize deposition control. By adjusting parameters such as the ratio of organic to inorganic materials, coating thickness, and material selection, the patent achieves precise deposition control while managing formulation complexity through methodical parameter optimization.
3Stability of the object's composition
If the patterning coating is applied across the entire surface, then uniform coverage is achieved, but selective deposition in transmissive regions cannot be controlled
Solution Approach 1:
The patent applies local quality by creating spatial variations in the patterning coating properties. The coating is formulated to have different material compositions or thicknesses in different regions, enabling selective deposition control in transmissive regions while maintaining uniform coverage in other areas. This allows the same patterning coating to serve multiple functional requirements across different device regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables precise control over the deposition of conductive layers, enhancing the optical properties and performance of opto-electronic devices while improving their stability, reliability, and lifetime.
Implementation Method 1
a patterning coating provided in a first portion of a lateral aspect of the device and adapted to impact a propensity of a vapor flux of a deposited material to be condensed thereon
Data Source
AI summary
A formulation and a layered semiconductor device comprising a patterning coating and a deposited layer. The formulation and the patterning coating may comprise a plurality of materials. In the formulation, each material may be a patterning material. The patterning coating may be provided in a first portion and the deposited layer may be provided in a second portion of a lateral aspect of the device. The patterning coating may be adapted to impact a propensity of a vapor flux of a deposited material to be condensed thereon. The deposited layer may comprise the deposited material.