Patterning Device with Integrated Heat Generating Layer

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Solution Overview

Problem

Conventional patterning techniques face limitations in resolution, cost, complexity, and usability with flexible substrates or organic materials, particularly in achieving large-area patterning due to issues with uniform pressure and heat application, which can damage substrates and deform polymer thin films.

Innovation Solution

A patterning device with a substrate, patterned layer, heat generating layer, electrodes, and protective layer that allows for controlled heat generation and pattern width adjustment, enabling uniform heat distribution and hierarchical patterning without the need for external ovens or hot plates, using materials like polyurethane acrylate and platinum for the heat generating layer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If thermal nanoimprint lithography using a halogen lamp is used to achieve large-area patterning, then patterning area is improved, but power consumption increases and device complexity increases due to requiring metal screen and heat sinker

Engineering Contradiction:

Improvepatterning areaVSAvoidpower consumption

Core Design Contradiction:

Area of stationary objectVSUse of energy by moving object

Solution Approach 1:

The patent merges the heating function directly into the mold by integrating a heat-generating layer (ITO or graphene) within the mold structure itself. This eliminates the need for separate external heating devices like halogen lamps, metal screens, and heat sinkers, thereby reducing power consumption while maintaining large-area patterning capability

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The mold is designed with multi-functionality by incorporating both the patterning function and the heating function into a single integrated structure. The heat-generating layer within the mold allows it to serve as both the pattern transfer tool and the heat source, eliminating the need for separate heating equipment

Inventive Principle:

Principle #6Universality (Multi-functionality)

2Ease of manufacture

If the entire region is heated to increase temperature to Tg of the polymer to achieve patterning, then patterning is enabled, but substrate damage occurs and polymer thin film deforms

Engineering Contradiction:

Improvepatterning capabilityVSAvoidsubstrate damage and film deformation

Core Design Contradiction:

Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The patent applies local quality by heating only the specific region where patterning is required rather than the entire substrate. The heat-generating layer is positioned precisely in the mold to transfer heat locally to the polymer thin film only in the contact area, avoiding thermal damage to the rest of the substrate and preventing film deformation

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The mold with integrated heat-generating layer is prepared in advance with the desired pattern structure. When pressed against the polymer thin film, the heat is immediately transferred to the contact region, enabling rapid localized heating to Tg without requiring prolonged heating of the entire substrate, thus preventing thermal damage

Inventive Principle:

Principle #10Preliminary action

3Manufacturing precision

If conventional lithography is used to form micro/nano-sized patterns, then patterning is achieved, but resolution is limited to about 100 nm due to light interference

Engineering Contradiction:

Improvepattern resolutionVSAvoidresolution limit

Core Design Contradiction:

Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent replaces optical lithography with mechanical nanoimprint lithography. Instead of using light to form patterns, a physical mold with the desired pattern is pressed directly onto the polymer thin film. This mechanical approach eliminates the diffraction limit of light, enabling resolution well below 100 nm while maintaining versatility for various substrate types

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables efficient, uniform, and rapid patterning over large areas with controlled pattern width and pressure, reducing processing time and energy consumption, while preventing substrate damage and allowing for mass production through rolling imprint methods.

Implementation Method 1

a heat generating layer disposed on the patterned layer, including a second pattern (corresponding to the first pattern) formed on a surface thereof, and generating heat when power is supplied

Methodology Applied

Scientific EffectJoule heating: Joule Heating

Data Source

PatentUS10025178B2Patterning device

Publication Date: 2018.07.17 RES & BUSINESS FOUND SUNGKYUNKWAN UNIV

AI summary

Disclosed is a patterning device. The patterning device may include a substrate; a patterned layer disposed on the substrate and including a first pattern formed on a surface thereof; a heat generating layer disposed on the patterned layer, including a second pattern (corresponding to the first pattern) formed on a surface thereof, and generating heat when electric power is supplied; and a first electrode and a second electrode disposed on the heat generating layer, spaced apart from each other, and electrically connected to the heat generating layer.