Complex Patterning Device with Master Substrate and Punching Module
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Solution Overview
Problem
Current methods for forming fine patterns, such as photolithography and RELACS, face limitations in achieving patterns below 30 nm due to resolution constraints and volume reduction of photosensitive films, necessitating the development of advanced patterning devices and methods that can create complex patterns on various substrates with improved stability and alignment.
Innovation Solution
A complex patterning device comprising a patterning module that forms target patterns on a substrate by contacting a master substrate and a punching module that divides these patterns, allowing for the creation of patterns of various sizes and shapes on different substrates with enhanced process stability and alignment, using a combination of pressure and precise movement mechanisms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography or RELACS process is used to form fine patterns, then pattern formation is achieved, but pattern size is limited to above 30 nm due to resolution constraints
Solution Approach 1:
The patterning process is divided into multiple steps: first forming a master pattern, then using it to create target patterns, and finally dividing the target patterns into finer patterns. This multi-stage segmentation allows achieving sub-30 nm precision that cannot be obtained in a single photolithography step.
Solution Approach 2:
A master pattern is formed in advance on a master substrate before the actual patterning of target substrates. This preliminary master pattern serves as a template that can be repeatedly used to create multiple target patterns, ensuring consistent sub-30 nm precision across all patterns.
2Manufacturing precision
If photosensitive film volume is reduced to achieve finer patterns, then pattern fineness is improved, but pattern formation becomes impossible due to volume depletion
Solution Approach 1:
The photosensitive film patterning is segmented into multiple exposure and development steps. Instead of attempting to form all fine patterns in a single step (which would require excessive film thickness), the process creates master patterns first, then uses them to form target patterns, and finally divides them into finer patterns, thereby forming fine patterns without depleting the photosensitive film volume.
Solution Approach 2:
The master pattern is copied onto target substrates multiple times. This copying approach allows the same master pattern to be used repeatedly to create numerous target patterns, eliminating the need to continuously reduce photosensitive film volume for each new fine pattern.
3Productivity
If multiple target patterns are formed on a substrate, then pattern quantity is increased, but alignment and division of these patterns becomes difficult
Solution Approach 1:
Alignment marks are formed in advance on both the master substrate and target substrates before the actual patterning process. These pre-formed alignment marks enable precise registration when the master pattern is transferred to multiple target substrates, simplifying the alignment of multiple patterns even as pattern quantity increases.
Solution Approach 2:
The alignment process uses feedback from the alignment marks to adjust the positioning of target substrates relative to the master substrate. This feedback mechanism ensures that multiple target patterns are accurately aligned and positioned, maintaining ease of operation despite increasing pattern quantity.
4Manufacturing precision
If the patterning device is designed for high precision, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patterning device is segmented into functionally independent modules: a master substrate holding unit, a target substrate holding unit, and a pressing unit. This modular segmentation achieves high patterning precision through controlled interaction between modules while keeping each module's structure relatively simple, thereby reducing overall device complexity.
Solution Approach 2:
The pressing unit serves multiple functions: it applies pressure to transfer the master pattern to target substrates, it ensures intimate contact between substrates for high precision, and it can be adjusted for different pattern sizes and shapes. This multi-functionality reduces the need for separate specialized components, simplifying the overall device structure while maintaining high precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of complex patterns with improved stability and alignment on various substrates, overcoming the limitations of existing technologies by allowing for easy division and alignment of patterns, thus facilitating the creation of fine patterns beyond the resolution limits of traditional methods.
Implementation Method 1
a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate
Implementation Method 2
a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate
Data Source
AI summary
Provided is a complex patterning device. The complex patterning device includes a patterning module, on which a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate, and a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate.