Patterning System Design Using Fidelity Simulation
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Solution Overview
Problem
Conventional lithography techniques face challenges in achieving satisfactory patterning results due to the limitations of focusing properties, such as focal point size, depth of focus, and working distance, which are not adequately addressed by existing methods like PREVAIL and LEEPL, leading to suboptimal pattern formation and substrate damage.
Innovation Solution
A method that incorporates patterning fidelity into the design of a patterning system by simulating and adjusting exposure and design parameters, including electrode thickness, lens diameters, and voltages, to optimize the patterning system's performance and ensure alignment with target specifications, such as critical dimensions and line edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If high-energy electron beam is used in lithography, then the electron dispersion in photoresistor is reduced, but the photoresistive sensitivity decreases and substrate damage increases
Solution Approach 1:
The patent changes the acceleration voltage parameter from conventional high energy (100 kV) to low energy (2 kV), which fundamentally alters the electron-beam interaction characteristics with the photoresistor and substrate, achieving both high resolution and high sensitivity simultaneously
2Measurement precision
If only focusing properties of electron beam are adjusted, then the focal point characteristics are optimized, but the overall patterning fidelity remains insufficient
Solution Approach 1:
The patent segments the design parameters into multiple independent categories (acceleration voltage, condenser lens parameters, objective lens parameters, aperture parameters) and optimizes each separately through systematic simulation, allowing comprehensive control over patterning fidelity
Solution Approach 2:
The patent performs preliminary simulation and optimization of design parameters before actual pattern formation, using computational models to predict and adjust patterning fidelity, thereby avoiding trial-and-error experimentation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures that the patterning system meets the desired fidelity specifications, reducing fabrication costs and improving the accuracy and reliability of pattern formation, while minimizing substrate damage.
Implementation Method 1
a high-energy electron beam with an acceleration voltage of about 100 kV is passed through part of a mask and projected onto a photoresistor
Implementation Method 2
the higher an electron acceleration voltage is, the less dispersed the electrons in a photoresistor are
Data Source
AI summary
A method which directly incorporates patterning fidelity into the design of a patterning system is provided. A production result of a target pattern is simulated according to a set of design parameters to obtain a simulated pattern. The target pattern is compared with the simulated pattern to obtain a patterning fidelity, and the values of the set of design parameters of the patterning system are adjusted according to a target patterning fidelity to optimize the values of the set of design parameters of the patterning system.