Patterning Rinse Composition for Magnetic Particle Defect Removal
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Solution Overview
Problem
The challenge of effectively removing magnetic particles from substrates with patterns after rinsing treatments, particularly in miniaturized electronic devices, where defects due to residual magnetic particles are prevalent, necessitates improved removability to enhance manufacturing quality.
Innovation Solution
A chemical liquid comprising water, a surfactant with a water-soluble polymer, a water-soluble organic solvent, and optionally a polyhydric alcohol and pH adjuster, which is used as a rinse liquid after alkaline development to enhance the dispersibility and removal of magnetic particles, reducing defects on the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If water rinsing is used to remove magnetic particles, then the rinsing process is simple, but magnetic particles remain on the substrate surface causing defects
Solution Approach 1:
The patent changes the chemical parameters of the rinsing liquid by adding surfactants and organic solvents to water, transforming it from a simple aqueous solution to a specialized chemical liquid that can effectively remove magnetic particles while maintaining process simplicity
Solution Approach 2:
The surfactant acts as an intermediary substance that mediates between the magnetic particles and the aqueous solution, reducing surface tension and enabling effective removal of particles without requiring complex mechanical or chemical processes
2Productivity
If conventional rinsing is used, then the process is fast and simple, but magnetic particle removal is incomplete
Solution Approach 1:
The patent creates a composite rinsing liquid by combining water, surfactants, and organic solvents in specific proportions, leveraging the synergistic effects of different components to achieve both rapid processing and complete particle removal
Solution Approach 2:
The patent optimizes parameters such as surfactant concentration (0.01-5% by mass), organic solvent content (5-50% by mass), and pH value (2-12) to achieve the optimal balance between rinsing speed and particle removal effectiveness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The chemical liquid effectively reduces the number of defects on patterned substrates by enhancing the removability of magnetic particles, improving the manufacturing process by minimizing residual particles on the substrate and in development equipment.
Implementation Method 1
the surfactant includes a water-soluble polymer
Implementation Method 2
a water-soluble organic solvent
Data Source
AI summary
A first object of the present invention is to provide a chemical liquid that is excellent in removability of a defect on a patterned substrate including a substrate and a pattern containing magnetic particles. Further, a second object of the present invention is to provide a pattern forming method using the chemical liquid. The chemical liquid of the present invention is a chemical liquid used in forming a pattern and contains magnetic particles, the chemical liquid comprising water, a surfactant, and a water-soluble organic solvent, in which the surfactant includes a water-soluble polymer.