Free-Standing PCD Membrane Transfer Using a Sacrificial Layer

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Solution Overview

Problem

Conventional methods for fabricating poly-crystalline diamond (PCD) membranes are limited by excessive etching processes, leading to high production costs and restricting the realization of large-scale, high-quality PCD membranes, which has driven many applications to use alternative materials with inferior properties.

Innovation Solution

A method involving the formation of a sacrificial layer on a substrate, followed by the deposition of a PCD membrane, and subsequent removal of the sacrificial layer to separate the PCD membrane, allowing for transfer and integration into various devices, including electronic and bioelectronic applications.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional etching processes are used to fabricate PCD membranes, then the membranes can be produced, but the production cost increases and large-scale high-quality membrane realization is restricted

Engineering Contradiction:
ImprovePCD membrane qualityVSAvoidproduction cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent applies preliminary action by forming a sacrificial layer (such as silicon dioxide) on the substrate before depositing the PCD membrane. This sacrificial layer is then selectively removed through etching to release the membrane. By performing the membrane release preparation in advance during the fabrication process rather than using excessive post-fabrication etching, the method reduces production costs while maintaining high membrane quality and enabling large-scale production.

Inventive Principle:
Principle #10Preliminary action

2Ease of operation

If excessive etching processes are used, then PCD membranes can be released from substrate, but the process complexity and production cost increase

Engineering Contradiction:
Improvemembrane releaseVSAvoidetching process
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The patent introduces a sacrificial layer as an intermediary element between the substrate and the PCD membrane. This sacrificial layer (typically silicon dioxide) serves as a temporary structure that facilitates membrane release. By etching away this intermediary sacrificial layer rather than directly etching the membrane-substrate interface multiple times, the process achieves easy membrane release with reduced process complexity and fewer etching steps.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Productivity

If conventional fabrication methods are used, then PCD membranes can be produced, but large-scale high-quality membrane production is restricted

Engineering Contradiction:
Improvemembrane production scaleVSAvoidmembrane quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies segmentation by dividing the fabrication process into distinct stages: forming the sacrificial layer on the substrate, depositing the PCD membrane on top of the sacrificial layer, and then selectively removing the sacrificial layer to release the membrane. This segmented approach allows for standardized, scalable production while maintaining high membrane quality, as each stage can be optimized independently and the process can be applied to large substrate areas.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the production of large-scale, high-quality, free-standing PCD membranes that can be easily integrated into devices, offering excellent mechanical and electrical properties, reducing production costs and enhancing performance in applications like flexible electronics and bioelectronics.

Implementation Method 1

removing the sacrificial layer, with a first surface of the carbonaceous membrane still facing the first substrate

Methodology Applied
Scientific EffectEtching:

Implementation Method 2

forming a carbonaceous membrane on the sacrificial layer

Methodology Applied
Scientific EffectDeposition: Deposition (physical)

Data Source

PatentUS20240186144A1Methods of forming carbonaceous membrane with free-standing form
Publication Date: 2024.06.06 FRAUNHOFER USA INC
  • US20240186144A1 patent drawing
  • US20240186144A1 patent drawing
  • US20240186144A1 patent drawing

AI summary

A method for providing a carbonaceous membrane is disclosed. The method includes forming a sacrificial layer on a first substrate. The method includes forming a carbonaceous membrane on the sacrificial layer. The method includes removing the sacrificial layer, with a first surface of the carbonaceous membrane still facing the first substrate. The method includes completely removing the first substrate from the carbonaceous membrane. The method includes coupling the carbonaceous membrane to a second substrate.