PCRAM Phase-Change Layer Composition for Low Reset Current

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

As device scaling-down continues, existing phase-change random-access memory (PCRAM) devices have not been entirely satisfactory in all respects, particularly in terms of performance and engineering advantages such as high speed, low power, non-volatility, high density, and low cost.

Innovation Solution

The implementation of a PCRAM structure that includes a phase-change memory cell and a field effect transistor, utilizing a phase-change material with a Ge-poor GST467 composition that contains a Ge content of about 20 at % or less, a Sb content of about 30 at % or more, and a Te content of about 40 at % or more, and a selector layer to control current flow and reduce leakage, along with a method of forming the memory device using co-sputtering and deposition processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If existing PCRAM devices are used, then basic memory functions are achieved, but data retention characteristics are insufficient and reset current is high

Engineering Contradiction:
Improvedata retention characteristicsVSAvoidreset current
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The patent changes the compositional parameters of the phase change material by using a Ge-poor GST467 alloy with specific atomic percentages (Ge: 20 at% or less, Sb: 30 at% or more, Te: 40 at% or more). This parameter change optimizes the material's phase transition properties, improving data retention while reducing the reset current required for amorphous state formation.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite material system consisting of the Ge-poor GST467 phase change material combined with a selector layer. This composite structure leverages the complementary properties of each material: the phase change material provides non-volatile memory functionality with improved retention, while the selector layer reduces leakage current and lowers the overall reset current requirement.

Inventive Principle:
Principle #40Composite materials

2Quantity of substance

If device scaling-down continues, then high density is achieved, but performance and engineering advantages deteriorate

Engineering Contradiction:
Improvehigh densityVSAvoidperformance
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The patent adjusts the compositional parameters of the phase change material to Ge-poor GST467, which maintains stable phase transition properties at scaled dimensions. This parameter optimization ensures that even as device size decreases for higher density, the material's crystalline and amorphous states remain distinct and stable, preserving performance characteristics.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The selector layer acts as an intermediary component that mediates between the scaled-down memory cell and the read/write circuitry. It controls current flow through the phase change material, ensuring sufficient current for reliable phase transitions even in miniaturized devices, while blocking leakage currents that become more significant at smaller scales.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves data retention characteristics and reduces reset current, enhancing the performance and stability of the PCRAM devices while maintaining low operational costs and high density.

Implementation Method 1

PCRAM technology is based upon a material that can be either amorphous or crystalline at normal ambient temperatures. When the material is in the amorphous state, the material has a high electrical resistance. When the material is in the crystalline state, the material has a low electrical resistance.

Methodology Applied
Scientific EffectPhase change: Phase Change

Implementation Method 2

a method of forming the memory device using co-sputtering and deposition processes

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS20240074337A1Memory device and method of making the same
Publication Date: 2024.02.29 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20240074337A1 patent drawing
  • US20240074337A1 patent drawing
  • US20240074337A1 patent drawing

AI summary

A memory device includes a substrate, a bottom electrode disposed over the substrate, a top electrode disposed over the bottom electrode, and a phase change layer disposed between the top electrode and bottom electrode. The phase change layer includes a GeSbTe material that contains a Ge content of about 20 at % or less, a Sb content of about 30 at % or more, and a Te content of about 40 at % at or more.