Pellicle Agglutinant Composition for Low-Residue Mask Peeling

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The challenge is to reduce peeling residues of the agglutinant layer remaining on the exposure original plate when a pellicle is peeled, especially after being used in lithography, particularly with ArF excimer lasers, as current methods struggle with residue removal under weak cleaning conditions.

Innovation Solution

The use of a polyvinyl ether compound in the agglutinant for pellicles, combined with an acrylic polymer, silicone resin, or thermoplastic elastomers, helps reduce peeling residues by improving the agglutinant's hydrophilicity and cohesive force, even when exposed to ultraviolet light.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If conventional agglutinants (polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin) are used to bond the pellicle to the exposure original plate, then the pellicle can be securely bonded, but peeling residues remain on the mask substrate after pellicle removal, causing cleaning difficulties and potential damage to phase shift films

Engineering Contradiction:
Improvebonding strengthVSAvoidpeeling residues
Core Design Contradiction:
StrengthVSObject-generated harmful factors

Solution Approach 1:

The invention changes the chemical composition parameters of the agglutinant by introducing polyvinyl ether compound as a key component. This chemical parameter change transforms the agglutinant's peeling characteristics, enabling clean removal without residues while maintaining adequate bonding strength during use.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention uses a composite agglutinant formulation combining polyvinyl ether compound with other compatible polymers. This composite material approach leverages the low-residue peeling properties of polyvinyl ether while maintaining the bonding performance needed for secure pellicle attachment during lithography operations.

Inventive Principle:
Principle #40Composite materials

2Object-generated harmful factors

If strong cleaning conditions are applied to remove peeling residues, then cleaning effectiveness improves, but damage occurs to the phase shift films on the mask substrate

Engineering Contradiction:
Improvecleaning effectivenessVSAvoiddamage to phase shift films
Core Design Contradiction:
Object-generated harmful factorsVSObject-affected harmful factors

Solution Approach 1:

The invention applies preliminary anti-action by formulating the agglutinant to inherently resist residue formation. By using polyvinyl ether compound, the agglutinant is designed to peel cleanly without leaving residues that would require strong cleaning actions, thereby preventing the need for damaging cleaning procedures.

Inventive Principle:
Principle #9Preliminary anti-action

Solution Approach 2:

The invention converts the potential harm of residue formation into a benefit by selecting materials that naturally peel cleanly. The polyvinyl ether compound provides low-residue peeling behavior, transforming what would be a cleaning problem into an advantage that protects the mask substrate during the cleaning process.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

3Manufacturing precision

If the pellicle is used to prevent dust adhesion to the exposure original plate, then pattern quality improves, but the pellicle itself becomes contaminated with dust and requires frequent replacement

Engineering Contradiction:
Improvepattern qualityVSAvoidpellicle service life
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The invention accepts the limited service life of the pellicle and designs the agglutinant for easy, residue-free removal. This allows for frequent replacement of the consumable pellicle while protecting the expensive mask substrate from contamination, effectively treating the pellicle as a disposable protective element.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The pellicle acts as an intermediary between the external environment (dust) and the exposure original plate. The agglutinant formulation ensures that when the pellicle needs replacement, it can be removed cleanly, maintaining the protective function during its service life while enabling easy disposal when contaminated.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for the successful reduction of peeling residues on the exposure original plate, facilitating smoother regeneration cleaning and reducing the risk of damage to the mask surface, thereby improving production efficiency in semiconductor and liquid crystal display board manufacturing.

Implementation Method 1

an agglutinant for bonding a pellicle to an exposure original plate, the agglutinant comprising a polyvinyl ether compound

Methodology Applied
Scientific EffectAdhesion: Adhesive

Implementation Method 2

a pellicle film stretched over the pellicle frame... that well transmits light used for exposure (g-rays, i-rays, 248 nm, 193 nm, 157 nm, etc.)

Methodology Applied
Scientific EffectLight transmission: Light

Data Source

PatentUS12265324B2Agglutinant for pellicle, pellicle, exposure original plate with pellicle, method for producing semiconductor device, method for producing liquid crystal display board, method for regenerating exposure original plate, and peeling residue reduction method
Publication Date: 2025.04.01 SHIN ETSU CHEMICAL CO LTD
  • US12265324B2 patent drawing

AI summary

Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.