Pellicle Manufacturing via Catalytic Membrane Deposition
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Solution Overview
Problem
During exposure processes, contaminants can damage photomasks, and existing methods for cleaning or protecting them are inadequate, particularly in maintaining the integrity of pellicle membranes used to prevent contamination.
Innovation Solution
A method of manufacturing a pellicle involving forming a membrane on a substrate using a chemical reaction, creating a frame by partially removing the substrate with an etchant solution, and replacing the etchant with solvents to support the membrane, ensuring the membrane's integrity and mechanical strength, with materials like graphite, carbon nanotubes, or graphene, and frames made from metals like iron, nickel, or copper.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a membrane is placed on the photomask surface to prevent contamination, then contamination protection is improved, but the membrane may be damaged during manufacturing or handling
Solution Approach 1:
The patent uses a thin membrane structure to protect the photomask while maintaining flexibility and integrity. The membrane is designed as a thin film that can conform to the photomask surface without being overly rigid, reducing the risk of damage during handling while still providing effective contamination protection.
Solution Approach 2:
The membrane acts as an intermediary layer between the photomask and the external environment. This intermediate structure prevents direct contact between contaminants and the photomask surface, while the membrane itself is designed to be robust enough to withstand manufacturing processes.
2Ease of operation
If the substrate is fully removed to create a frame structure, then ease of handling is improved, but the membrane loses support and mechanical strength
Solution Approach 1:
The substrate is selectively removed in specific regions to form a frame structure, while leaving portions intact to provide support. This segmentation allows the membrane to be supported where needed while creating open areas that improve handling and reduce material usage.
Solution Approach 2:
The final structure combines the membrane material with the remaining substrate frame, creating a composite structure that leverages the strengths of both components. The frame provides mechanical support and handling capability, while the membrane provides contamination protection.
3Manufacturing precision
If an etchant solution is used to remove the substrate, then manufacturing precision is improved, but the membrane may be damaged by the etchant
Solution Approach 1:
The etchant solution is applied selectively to specific regions of the substrate where removal is desired, while protecting areas where the substrate should remain. This localized application ensures precise substrate removal without exposing the membrane to unnecessary etching, maintaining both manufacturing precision and membrane integrity.
Solution Approach 2:
A protective layer or mask is used as an intermediary during the etching process to shield the membrane from the etchant solution. This intermediary allows the etchant to selectively remove the substrate in desired areas while preventing damage to the membrane.
4Manufacturing precision
If solvents are used to remove protective patterns, then manufacturing precision is improved, but multiple solvent replacement steps increase process complexity
Solution Approach 1:
The patent employs multiple solvent replacement steps with progressively changing parameters (solvent types, concentrations, temperatures) to systematically remove protective patterns without damaging the membrane. Each solvent is selected with specific properties optimized for removing particular protective materials, achieving high precision despite increased process steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively forms a pellicle with improved mechanical properties, preventing membrane damage and contamination, allowing for precise pattern formation in photolithography processes while maintaining the membrane's integrity and reducing contamination risks.
Implementation Method 1
forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst
Implementation Method 2
immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame
Implementation Method 3
replacing the etchant solution with a solvent to remove the protective pattern
Implementation Method 4
The second solvent may be removed by evaporation
Data Source
AI summary
A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.