Pellicle Support Frame with Si-O Coating for Haze Prevention
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Solution Overview
Problem
Existing support frames for pellicles in semiconductor manufacturing fail to completely inhibit ion elution, especially when using short wavelength lasers, leading to haze formation and reduced pattern quality.
Innovation Solution
A support frame with an anodized film and a specific inorganic coating layer composed of —Si—O—Si—O— bonds is used, which reduces ion elution to the utmost limit and provides high light resistance and durability, preventing haze generation even with short wavelength lasers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an anodized film is formed on aluminum material using conventional methods, then corrosion resistance is improved, but ion elution cannot be completely inhibited leading to haze formation
Solution Approach 1:
The patent applies composite materials by combining the anodized film (providing corrosion resistance) with an inorganic coating layer containing silicon oxide (providing ion elution resistance). This multi-layer composite structure allows both corrosion resistance and ion elution inhibition to coexist, resolving the technical contradiction between these two properties.
Solution Approach 2:
The patent changes the chemical composition parameters of the coating layer by specifying silicon oxide with particular properties (ion elution resistance). By adjusting the material composition from conventional single-layer anodized film to a composite with specific inorganic coating, the ion elution parameter is controlled to meet the requirements for preventing haze formation.
2Manufacturing precision
If short wavelength lasers are used for lithography, then pattern fineness is improved, but ion elution increases causing haze generation
Solution Approach 1:
The patent applies preliminary anti-action by pre-forming the ion elution resistant inorganic coating layer on the anodized film before the lithography process. This preliminary protective layer counteracts the harmful ion elution effect that would otherwise be caused by the high-energy short wavelength laser, allowing the laser to be used for high-precision patterning without generating haze.
3Reliability
If inorganic acid remains on the anodized film surface, then corrosion resistance is improved, but reaction products cause clouding in the pellicle
Solution Approach 1:
The patent applies the taking out principle by extracting or removing the inorganic acid from the anodized film surface through the formation of the inorganic coating layer. This coating layer prevents the inorganic acid from remaining on the surface, thereby preventing the formation of reaction products that would cause clouding in the pellicle, while still maintaining corrosion resistance through the anodized film structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces ion elution and haze formation, ensuring high light resistance and durability, suitable for fine pattern formation in semiconductor manufacturing with short wavelength lasers.
Implementation Method 1
an anodized film is formed on a surface of the aluminum material by anodizing treatment with an alkaline aqueous solution containing tartaric acid
Implementation Method 2
the main chain of the inorganic coating layer is constituted by a —Si—O—Si—O— bond
Data Source
AI summary
Provided are: a support frame for pellicle that has both low dust generation property and high light resistance, and further has an ion elution amount which is reduced to the utmost limit to an extent that haze is not generated even when a short wavelength laser is used for exposure light source, a pellicle using the support frame for pellicle, and a method for efficiently manufacturing the support frame for pellicle, support frame for pellicle which comprises a frame member comprising aluminum or aluminum alloy and an inorganic coating layer formed on the surface of the frame member, wherein the main chain of the inorganic coating layer is constituted by a —Si—O—Si—O— bond. An anodized film is preferably formed between the frame member and the inorganic coating layer.