Pellicle-Free Lithography Device Using Laser Particle Elimination

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Solution Overview

Problem

Conventional lithography devices with pellicles suffer from optical loss and pellicle distortion issues due to high temperature environments, affecting accuracy and efficiency.

Innovation Solution

A pellicle-free lithography device equipped with a particle removing apparatus that uses a laser-based particle eliminating component and a force field generator to remove particles from the photomask area, eliminating the need for a pellicle and enhancing optical efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a pellicle is applied to block particles from entering the photomask, then particle contamination is prevented, but optical loss occurs due to optical transmission through the pellicle

Engineering Contradiction:

Improveparticle contamination preventionVSAvoidoptical loss

Core Design Contradiction:

ReliabilityVSLoss of energy

Solution Approach 1:

The invention extracts and removes the pellicle from the lithography system entirely. Instead of using a pellicle to block particles, the system employs a particle removal apparatus that actively removes particles from the environment, eliminating the need for the pellicle and its associated optical losses.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The invention replaces the passive mechanical barrier (pellicle) with an active particle removal system using electromagnetic fields (electric fields from charged plates or magnetic fields from magnets) to attract and remove particles, substituting a mechanical filtering approach with a field-based particle control mechanism.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Loss of energy

If the pellicle is thinned to improve optical efficiency, then optical transmission is improved, but the pellicle becomes fragile and hard to handle or clean

Engineering Contradiction:

Improveoptical efficiencyVSAvoidhandling and cleaning ease

Core Design Contradiction:

Loss of energyVSEase of operation

Solution Approach 1:

The invention completely removes the pellicle from the system, eliminating all handling and cleaning operations associated with it. The particle removal apparatus maintains particle protection without requiring a physical pellicle that needs to be installed, handled, or maintained.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The particle removal apparatus operates autonomously to maintain a particle-free environment, eliminating the need for manual pellicle cleaning or replacement. The system self-regulates particle contamination without requiring human intervention for pellicle maintenance.

Inventive Principle:

Principle #25Self-service

3Reliability

If a conventional pellicle is used in a high temperature lithography environment, then particle blocking is maintained, but the pellicle becomes distorted affecting lithography accuracy

Engineering Contradiction:

Improveparticle blocking capabilityVSAvoidlithography accuracy

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The invention replaces the thermal-sensitive mechanical pellicle structure with a field-based particle removal system using electric or magnetic fields. These fields are not susceptible to thermal distortion, maintaining particle blocking capability while eliminating temperature-induced accuracy degradation.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention changes the fundamental operating parameter from passive optical filtering (pellicle transmission) to active field-based particle manipulation. By using electric or magnetic fields instead of physical barriers, the system maintains particle protection while being immune to thermal effects that distort conventional pellicles.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution prevents pellicle distortion and optical loss, ensuring high optical efficiency and improved lithography accuracy without the fragility and handling issues associated with conventional pellicles.

Implementation Method 1

a laser-based particle eliminating component includes a laser emitter configured to emit laser beams for irradiating particles in a space near a photomask of the lithography device

Methodology Applied

Scientific EffectLaser ablation: Laser Ablation

Implementation Method 2

a force field generator configured to generate an electromagnetic field for attracting the irradiated particles

Methodology Applied

Scientific EffectElectromagnetic force: Lorentz Force

Data Source

PatentUS20180284628A1Lithography device and apparatus and method for lithography device

Publication Date: 2018.10.04 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

AI summary

An apparatus for a lithography device is provided, which includes a laser-based particle eliminating component and a particle collector. The laser-based particle eliminating component includes a laser emitter and a laser absorbing member. The laser emitter is configured to emit laser beams for irradiating particles in a space near a photomask of the lithography device. The laser absorbing member is disposed opposite to the laser emitter for absorbing the laser beams. The particle collector is configured for collecting the irradiated particles.