Pellicle Mask Adhesive Layer for Double Patterning
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Solution Overview
Problem
The position deviation of patterns in double patterning occurs due to mask distortion, which is caused by the softness of the mask adhesive layer, leading to handling difficulties and adhesive residue issues during the pellicle mounting and removal processes.
Innovation Solution
A pellicle with a mask adhesive layer containing a specific composition of styrene resin, polypropylene, and propylene-based elastomer, which provides appropriate softness and reduces adhesive residue, ensuring good handling characteristics and minimizing pattern position deviation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the mask adhesive layer is made softer to reduce mask distortion, then the position deviation of patterns is reduced, but handling difficulty increases and adhesive residue problems occur
Solution Approach 1:
The patent changes the physical and chemical parameters of the mask adhesive layer by controlling the glass transition temperature (Tg) to be -50°C to 0°C and the storage elastic modulus at 25°C to be 10⁵ to 10⁹ Pa·s. These parameter adjustments optimize the balance between softness (reducing mask distortion) and handling characteristics (preventing adhesive residue and ease of operation).
Solution Approach 2:
The patent uses composite material composition consisting of specific resin components (styrene-based resin, polypropylene, and elastomer) in controlled ratios. This composite structure provides both the required softness for minimizing pattern position deviation and the appropriate mechanical properties for easy handling and minimal adhesive residue.
2Manufacturing precision
If the mask adhesive layer is made softer to reduce mask distortion, then patterning accuracy is improved, but adhesive residue increases
Solution Approach 1:
The patent controls the glass transition temperature (Tg) within -50°C to 0°C and the storage elastic modulus at 25°C within 10⁵ to 10⁹ Pa·s. This parameter optimization ensures the adhesive layer is soft enough to minimize mask distortion and improve patterning accuracy, while remaining firm enough to prevent excessive adhesive residue during pellicle removal.
Solution Approach 2:
The patent creates different local properties within the mask adhesive layer through its composite composition of resin, polypropylene, and elastomer. The material exhibits appropriate softness at the interface with the mask to prevent distortion, while maintaining sufficient cohesion and adhesion properties to minimize residue during removal.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The pellicle's mask adhesive layer with a phase-separated structure and optimized viscoelastic properties prevents mask distortion and adhesive residue, enhancing patterning accuracy and handling, particularly in double patterning applications.
Implementation Method 1
the mask adhesive layer contains 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed
Implementation Method 2
a maximum value of tan δ in dynamic viscoelasticity of the mask adhesive layer is 1.5 to 5, and storage elastic modulus of the mask adhesive layer at 25° C. is 4.1×10^5 Pa·s to 1×10^9 Pa·s
Data Source
AI summary
Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.