Pellicle Membrane Handling via Sublimable Support Layer

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Solution Overview

Problem

The manufacturing of integrated circuit devices faces challenges in handling and protecting very thin pellicle membranes during the lithography process, as they are prone to deformation and contamination, leading to defects in the substrate patterns.

Innovation Solution

A method of manufacturing a pellicle assembly involves forming a sublimable support layer on the pellicle membrane, attaching a pellicle frame, and then sublimating the support layer to securely bond the membrane to the frame, allowing for easier handling and minimizing damage, using techniques like vapor deposition and sublimation processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a very thin pellicle membrane is directly attached to a large pellicle frame, then the membrane is prone to deformation and damage during handling, but adding a support layer increases the complexity of the manufacturing process

Engineering Contradiction:
Improvehandling reliability of pellicle membraneVSAvoidmanufacturing process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

A sublimable support layer is introduced as an intermediary between the pellicle membrane and the external environment during handling. This support layer provides mechanical strength and stability, enabling safe attachment to the pellicle frame. After attachment, the support layer is removed through sublimation, leaving only the membrane on the frame. This mediator approach resolves the contradiction by temporarily adding complexity to enable reliable handling, then eliminating the added complexity.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The support layer material is selected to undergo phase change (sublimation) at specific temperature and pressure conditions. By changing the physical parameters (temperature, pressure) during the manufacturing process, the support layer transitions from a solid state that provides structural support to a gaseous state that allows easy removal. This parameter change enables the support layer to serve its dual function of providing strength during handling and being easily eliminated afterward.

Inventive Principle:
Principle #35Parameter changes

2Ease of operation

If a sublimable support layer is formed on the pellicle membrane to enable easy handling, then handling ease is improved, but the support layer must be removed later adding an extra processing step

Engineering Contradiction:
Improveease of handling pellicle membraneVSAvoidmanufacturing productivity
Core Design Contradiction:
Ease of operationVSProductivity

Solution Approach 1:

The support layer is made of a sublimable material that transitions directly from solid to gas phase under controlled temperature and pressure conditions. This phase transition property allows the support layer to be easily removed after serving its handling function, converting a potentially time-consuming removal process into a efficient phase change process that can be performed in a single processing step.

Inventive Principle:
Principle #36Phase transitions

Solution Approach 2:

Instead of using mechanical removal methods (such as scraping, peeling, or chemical etching) to remove the support layer, the invention employs thermal energy to induce sublimation. This replaces complex mechanical or chemical removal systems with a simpler thermal field approach, reducing process complexity and improving manufacturing efficiency despite adding a processing step.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Strength

If the pellicle membrane is made very thin to reduce stress, then stress on the membrane is reduced, but the membrane becomes difficult to handle and attach without deformation

Engineering Contradiction:
Improvestress resistance of pellicle membraneVSAvoidease of attaching pellicle membrane
Core Design Contradiction:
StrengthVSEase of operation

Solution Approach 1:

The sublimable support layer is applied to the pellicle membrane in advance, before the attachment process. This preliminary action provides the thin membrane with the mechanical strength and dimensional stability needed for handling. The support layer acts as a temporary reinforcement that enables the membrane to be manipulated and attached without deformation, after which it is removed through sublimation.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

During the handling and attachment phase, the pellicle membrane and sublimable support layer form a composite structure. The support layer contributes mechanical strength and rigidity, while the membrane provides the functional properties. This composite material approach allows the thin membrane to be handled effectively. After attachment, the support layer is removed, leaving the original thin membrane intact on the frame.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the pellicle membrane to be handled and attached to the pellicle frame without deformation, reducing stress and damage, and allows for efficient removal of the support layer, thereby improving the productivity and quality of the lithography process.

Implementation Method 1

The sublimable support layer is sublimated while the pellicle frame is attached to the pellicle membrane to remove the sublimable support layer from the pellicle membrane

Methodology Applied
Scientific EffectSublimation: Sublimation

Implementation Method 2

The first surface of the pellicle membrane is exposed by sublimating the sublimable material from the sublimable support structure

Methodology Applied
Scientific EffectSublimation: Sublimation

Data Source

PatentUS11073757B2Methods of manufacturing pellicle assembly and photomask assembly
Publication Date: 2021.07.27 SAMSUNG ELECTRONICS CO LTD
  • US11073757B2 patent drawing
  • US11073757B2 patent drawing
  • US11073757B2 patent drawing

AI summary

Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.