Pellicle Optical Member for Lithographic Mask Repair
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Solution Overview
Problem
The existing mask repair processes in photolithography cause permanent and irreversible damage to the mask, making it challenging to accurately produce desired exposure patterns without compromising the mask's integrity.
Innovation Solution
A photolithographic mask design incorporating a pellicle with a transmissive or reflective substrate and a thin membrane, along with an optical member within the membrane, which isolates the pattern layer from ambient and allows for local adjustments to the projected pattern, minimizing damage during the repair process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If mask local treatments (repair process or Zeiss CDC) are performed to accurately produce desired exposure patterns, then manufacturing precision is improved, but the mask suffers permanent and irreversible damage
Solution Approach 1:
The mask system is segmented into two functional parts: the mask itself and the pellicle. The pellicle is a separate component that can be replaced independently when damaged, while the mask remains intact. This segmentation allows the pattern-defining mask to be preserved while the protective pellicle absorbs the damage from local treatments and environmental exposure.
Solution Approach 2:
The pellicle acts as an intermediary protective layer between the mask and the external environment. It isolates the mask from direct exposure to contaminants and allows local treatments to be performed on the pellicle rather than the mask, preventing permanent damage to the mask while still enabling manufacturing precision improvements.
2Reliability
If the mask is isolated from ambient environment using a pellicle, then mask protection is improved, but device complexity increases
Solution Approach 1:
The pellicle is implemented as a thin, flexible membrane that provides effective environmental protection for the mask. This thin-film approach achieves reliable isolation from ambient conditions while minimizing the added complexity and bulk, as the pellicle can be made extremely thin while still providing the necessary protective function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables precise pattern projection while minimizing mask damage, ensuring consistent and accurate photolithography results without incurring permanent alterations to the mask, thus extending its usability and maintaining image quality.
Implementation Method 1
a pellicle attached to the substrate and configured to isolate the pattern layer from ambient. The pellicle includes a membrane between the pattern layer and ambient
Implementation Method 2
an optical member disposed in the membrane. The optical member is configured to locally adjust a projected pattern on the semiconductor wafer
Implementation Method 3
an optical member disposed in the membrane. The optical member is configured to locally adjust a projected pattern on the semiconductor wafer
Data Source
AI summary
The present disclosure provides a mask for photolithography patterning. The mask includes a substrate, a pattern layer on a surface of the substrate. The mask also includes a pellicle attached to the substrate and configured to isolate the pattern layer from ambient. The pellicle includes a membrane between the pattern layer and ambient, a frame for securing the membrane on the substrate, and an optical member disposed in the membrane. A method for manufacturing the mask is also provided.