Pellicle Wrinkle Removal via Vapor Treatment

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Solution Overview

Problem

The existing methods for manufacturing pellicles for photomasks in EUV photolithography processes face challenges in removing wrinkles from the thin pellicle membranes, which can lead to critical dimension variations and image distortion during the photo-exposure process.

Innovation Solution

A pellicle assembling apparatus and method that involves coating a pellicle frame with an adhesive layer, loading the pellicle membrane into a chamber, and maintaining a vapor atmosphere to treat the membrane, which removes wrinkles and attaches it to the frame, followed by drying to create a smooth, wrinkle-free pellicle assembly.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If the pellicle membrane is made thin for EUV photolithography, then transmittance is improved, but wrinkle removal becomes difficult and manufacturing precision deteriorates

Engineering Contradiction:
ImprovetransmittanceVSAvoidwrinkle removal
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

The patent applies vapor treatment to change the physical and chemical parameters of the pellicle membrane surface. The vapor atmosphere modifies surface energy and promotes adhesive layer uniformity, enabling effective wrinkle removal while maintaining the thin membrane structure required for EUV transmittance.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces an adhesive layer as an intermediary between the pellicle membrane and the frame. This adhesive layer, when treated with vapor, creates a uniform bonding interface that effectively removes wrinkles from the thin membrane without requiring mechanical intervention that could damage the membrane.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If vapor treatment is applied to remove wrinkles, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvewrinkle removalVSAvoidvapor treatment system
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The vapor treatment system serves multiple functions simultaneously: it removes wrinkles from the pellicle membrane, activates the adhesive layer for optimal bonding, and creates a controlled environment for uniform attachment. This multi-functionality reduces the need for separate processing steps and equipment.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent combines the wrinkle removal process and the adhesive activation process into a single vapor treatment step. By merging these two functions into one atmospheric treatment, the system achieves high manufacturing precision without proportionally increasing device complexity.

Inventive Principle:
Principle #5Merging (Combining)

3Stability of the object's composition

If the pellicle membrane is attached to the frame, then structural stability is improved, but wrinkles may form reducing manufacturing precision

Engineering Contradiction:
Improvestructural stabilityVSAvoidwrinkle formation
Core Design Contradiction:
Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The patent applies vapor treatment to the pellicle membrane and adhesive layer before attachment to the frame. This preliminary treatment prepares the surfaces for optimal bonding, ensures uniform adhesive properties, and removes potential wrinkles before the membrane is constrained by the frame, preventing wrinkle formation during attachment.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method and apparatus ensure a smooth, wrinkle-free pellicle membrane with excellent durability and transmittance, minimizing critical dimension variations and enhancing the photomask's performance by maintaining the pellicle's integrity and reducing contaminants during the photo-exposure process.

Implementation Method 1

A liquid may be received into a bath which is under the pellicle support, and is vaporized to maintain the chamber in vapor atmosphere

Methodology Applied
Scientific EffectVaporization: Evaporation

Implementation Method 2

preparing a pellicle frame having an adhesive layer coated thereon

Methodology Applied
Scientific EffectAdhesion: Adhesive

Implementation Method 3

The pellicle membrane is dried

Methodology Applied
Scientific EffectDrying: Desiccation

Data Source

PatentUS11067887B2Apparatus for manufacturing pellicle
Publication Date: 2021.07.20 SAMSUNG ELECTRONICS CO LTD
  • US11067887B2 patent drawing
  • US11067887B2 patent drawing
  • US11067887B2 patent drawing

AI summary

A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.