Phase-Locked Variable Clock for RF Impedance Matching Control

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Solution Overview

Problem

Existing substrate processing systems face challenges in accurately and efficiently controlling RF energy coupling to plasma chambers due to the high cost and time-consuming nature of tunable reactors, leading to potential substrate and chamber damage from inaccurate impedance matching.

Innovation Solution

A phase locked loop circuit generates a variable clock synchronized with the tunable RF frequency, enabling a more precise control signal for the RF matching unit, ensuring accurate impedance matching by adjusting both the RF signal frequency and reactor values based on real-time chamber conditions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a fixed frequency RF source with two tunable reactors is used, then impedance matching capability is improved, but system cost and tuning time increase significantly

Engineering Contradiction:
Improveimpedance matching capabilityVSAvoidsystem cost and tuning time
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the operating frequency parameter of the RF source from fixed to tunable, allowing the system to achieve impedance matching by varying frequency rather than relying on two expensive tunable reactors. This reduces device complexity while maintaining matching capability.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent extracts one of the two tunable reactors from the matching circuit, reducing system complexity. By using a tunable frequency RF source combined with a single tunable reactor, the system achieves equivalent impedance matching performance with fewer components.

Inventive Principle:
Principle #2Taking out (Extraction)

2Device complexity

If a fixed clock signal unrelated to RF frequency is used for impedance analysis, then system simplicity is maintained, but measurement accuracy deteriorates

Engineering Contradiction:
Improvesystem simplicityVSAvoidimpedance measurement accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent transitions from a static fixed clock signal to a dynamic variable clock signal whose frequency tracks the RF source frequency. This dynamic adjustment ensures the impedance analyzer remains synchronized with the actual operating conditions, improving measurement accuracy without significantly increasing system complexity.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent implements a feedback mechanism where the variable clock frequency is continuously adjusted based on the RF source frequency. This feedback loop ensures the impedance analysis remains accurate even as operating conditions change, resolving the contradiction between simplicity and precision.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the accuracy and efficiency of RF energy coupling, reducing the risk of substrate and chamber damage by providing a more precise control over the impedance matching process, thereby improving the overall substrate processing efficiency.

Implementation Method 1

a phase locked loop circuit for generating a relative clock that is phase locked to a variable frequency signal being used by a substrate processing chamber

Methodology Applied
Scientific EffectPhase locking:

Data Source

PatentUS9960776B2Method and apparatus for generating a variable clock used to control a component of a substrate processing system
Publication Date: 2018.05.01 APPLIED MATERIALS INC
  • US9960776B2 patent drawing
  • US9960776B2 patent drawing
  • US9960776B2 patent drawing

AI summary

Methods and apparatus for generating a variable clock used to control a component of a substrate processing system are provided herein. In some embodiments, an apparatus for controlling a substrate processing system includes: a phase locked loop circuit for generating a relative clock that is phase locked to a variable frequency signal being used by a substrate processing chamber; and a controller, coupled to the phase locked loop circuit, for producing a control signal for a component of the substrate processing system, wherein the control signal is based upon the relative clock and an operating indicia of the substrate processing system.