Phase-Mask Lattice Inspection for High-Throughput Semiconductor Checks
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Solution Overview
Problem
Existing non-destructive methods for checking semiconductor components with periodic structures suffer from complex implementation and low throughput, while destructive methods like scanning electron microscopy are inefficient for fast and accurate inspection.
Innovation Solution
An apparatus and method utilizing a measurement radiation source, optics system, camera device, and phase mask device with a dual lattice to enable high-throughput and accurate inspection by interferometrically comparing substructure positions and phases, allowing direct detection of amplitude and phase deviations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If non-destructive methods like tomographic or ptychographic methods using x-ray light are used, then measurement precision is improved, but device complexity increases and productivity decreases
Solution Approach 1:
The patent replaces complex mechanical scanning systems with an optical interferometry system. Instead of using tomographic or ptychographic methods that require complex mechanical movements and multiple measurements, the invention uses optical interference patterns to directly obtain phase and amplitude information about the periodic structure, thereby reducing device complexity while maintaining measurement precision
Solution Approach 2:
The patent creates an optical copy of the periodic structure's phase and amplitude information through interferometric measurement. The phase mask device generates interference patterns that are optical copies of the sample's structural information, allowing direct measurement without complex mechanical reconstruction processes
2Measurement precision
If non-destructive methods like tomographic or ptychographic methods using x-ray light are used, then measurement precision is improved, but productivity decreases
Solution Approach 1:
The patent enables continuous inspection by using an optical system that can measure periodic structures in real-time without requiring stopping, scanning, or multiple measurement passes. The interferometric method provides continuous phase and amplitude information across the entire periodic structure, maintaining high productivity while achieving high measurement precision
Solution Approach 2:
The replacement of mechanical scanning with optical interferometry eliminates the time-consuming mechanical movements required by tomographic methods, enabling rapid, high-throughput inspection that maintains precision without sacrificing productivity
3Device complexity
If conventional intensity images are used for comparison, then device complexity is reduced, but measurement precision deteriorates due to conventional resolution limits
Solution Approach 1:
The patent changes the measurement parameter from intensity to phase and amplitude by using interferometric detection. The phase mask device converts structural information into phase variations that can be measured with much higher precision than conventional intensity imaging, overcoming the diffraction limit while keeping the optical system relatively simple
Solution Approach 2:
The patent introduces a phase mask device as an intermediary element that mediates between the sample and the detector. This phase mask converts the sample's structural information into measurable phase and amplitude variations in the interference pattern, enabling high-precision measurement without requiring complex super-resolution microscopy systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves fast and reliable inspection of semiconductor components with high accuracy, overcoming conventional resolution limits and enabling efficient in-line quality control of periodic structures.
Implementation Method 1
The apparatus can have a superior accuracy in comparison with certain known inspection methods, which are based on the comparison of conventional intensity images. The apparatus can be suitable for a relatively fast and sufficiently accurate inspection of the component within a production line or for an in-line inspection.
Implementation Method 2
The apparatus can help enable a direct interferometric comparison between a position of a respective individual substructure and its target position. In contrast to a comparison with intensity images captured using a conventional microscopy objective, this can help enables a direct and simultaneous detection of amplitude deviations and phase deviations.
Data Source
AI summary
An apparatus for checking a component with a periodic structure having substructures arranged on a lattice, the apparatus comprising a measurement radiation source for creating measurement radiation, an optics system, and a camera device. The apparatus further comprises a phase mask device for influencing a phase angle of the measurement radiation and/or an amplitude of the measurement radiation. The phase mask device comprises a dual lattice which is reciprocal to a target shape of the lattice.