Phase Mask Fringe Generation for Low-Overhead SIM

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Solution Overview

Problem

Existing Structured Illumination Microscopy (SIM) systems face challenges with expensive and inefficient spatial light modulators (SLMs) that are complex and require additional optical and electronic overhead.

Innovation Solution

A phase mask with a light blocking layer and optically transmissive regions, configured to spatially modulate intensity and phase, is used in a confocal microscope to generate fringe patterns for improved imaging.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a spatial light modulator (SLM) is used to generate fringe patterns for SIM, then arbitrary intensity and phase modulation is achieved, but the system becomes prohibitively expensive, inefficient in light power utilization, and requires complex optical and electronic overhead

Engineering Contradiction:
Improvearbitrary intensity and phase modulation capabilityVSAvoidoptical and electronic overhead
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent extracts only the essential function of fringe pattern generation from the complex SLM system. By using a simple phase mask with fixed phase shifts (0, 2π/3, 4π/3) combined with intensity modulation, the system achieves the necessary structured illumination without the arbitrary modulation capability of SLMs, thereby eliminating the complex optical and electronic overhead while maintaining core functionality

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the expensive, complex SLM with a simple, inexpensive phase mask that can be manufactured as a static optical element. This phase mask, combined with intensity modulation, provides a cost-effective solution that sacrifices arbitrary phase modulation capability but maintains sufficient functionality for SIM applications

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

2Ease of operation

If a spatial light modulator (SLM) is used to generate fringe patterns, then spatial modulation of intensity and phase is achieved, but light power utilization becomes inefficient

Engineering Contradiction:
Improvespatial modulation capabilityVSAvoidlight power utilization efficiency
Core Design Contradiction:
Ease of operationVSLoss of energy

Solution Approach 1:

The patent extracts only the spatial modulation function needed for SIM from the SLM system. By using a phase mask with predetermined phase shifts combined with intensity modulation, the system achieves spatial modulation of the illumination beam without the inefficiencies of SLMs, thereby improving light power utilization while maintaining the essential spatial modulation capability

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the electronically-controlled SLM system with a static phase mask optical element. This substitution eliminates the energy inefficiencies associated with SLM operation while maintaining the spatial modulation capability through the fixed phase pattern and intensity modulation approach

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The phase mask achieves higher efficiency and lower cost than SLMs, enabling superior spatial resolution and intensity discrimination in SIM applications like Raman Spectroscopy and Fluorescence Spectroscopy.

Implementation Method 1

A phase mask with a light blocking layer and optically transmissive regions, configured to spatially modulate intensity and phase

Methodology Applied
Scientific EffectPhase modulation: Phase Modulation

Implementation Method 2

generate fringe patterns for improved imaging

Methodology Applied
Scientific EffectDiffraction: Diffraction

Data Source

PatentEP4106618B1Phase mask for structured illumination
Publication Date: 2026.01.28 THERMO ELECTRONICS SCI INSTR LLC
  • EP4106618B1 patent drawingFigure 1
  • EP4106618B1 patent drawingFigure 2
  • EP4106618B1 patent drawingFigure 3

AI summary

An embodiment of a phase mask is described that comprises a light blocking layer disposed on a substrate, where the light blocking layer has a number of optically transmissive regions each configured as a first pattern. The first pattern includes two segments that have different phase configurations from each other, and the light blocking layer includes at least three angular orientations of the first pattern.