Phase Modulation Element for Lithographic Pattern Deviation Compensation
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Solution Overview
Problem
Lithographic apparatuses often result in pattern features on substrates that deviate from intended properties, such as best focus, shape, or location, leading to functional failures in devices.
Innovation Solution
A method that involves obtaining information on deviations, determining a desired phase change for a radiation beam using a phase modulation element, and implementing this change to compensate for the deviations, by configuring controllable regions to adjust the phase of the beam and compensate for errors in pattern features.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithographic exposure is used, then the manufacturing process is simple and fast, but the pattern features deviate from intended properties (best focus, shape, location)
Solution Approach 1:
A phase modulation element is introduced as an intermediary component in the radiation path between the radiation source and the substrate. This element modulates the phase of the radiation beam to compensate for pattern feature deviations, thereby improving manufacturing precision without fundamentally changing the lithographic process architecture
Solution Approach 2:
The phase modulation element is configured in advance to provide the required phase modulation before the radiation exposes the substrate. By pre-compensating for expected deviations in pattern features (such as best focus, shape, or location), the system achieves higher precision without requiring post-processing corrections
2Manufacturing precision
If phase modulation element is added to compensate for deviations, then pattern feature accuracy improves, but the device complexity and operational complexity increase
Solution Approach 1:
The phase modulation element is designed to automatically provide the required phase modulation based on its configuration. The system self-regulates the phase correction without requiring complex real-time control mechanisms, thereby maintaining ease of operation while improving precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively reduces and minimizes deviations in pattern features, ensuring they meet intended properties, thereby enhancing the functionality and accuracy of devices produced.
Implementation Method 1
determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate
Data Source
AI summary
In an embodiment, there is provided a method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus. The method includes determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate and which would at least partially compensate for the deviation in the property. The determination of the desired phase change includes determining a desired configuration of a phase modulation element. The method further includes implementing the desired phase change to the portion of the radiation beam when applying the pattern feature to the substrate, the implementation of the desired phase change comprising illuminating the phase modulation element with the portion of the radiation beam when the phase modulation element is in the desired configuration.