Phase-Separated Resin Composition for Wider Pitch Process Margins
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resin compositions for forming phase-separated structures using block copolymers have limited process margins due to narrow pitch variations, necessitating the preparation of multiple block copolymers for different pitch designs, which is inefficient and restrictive.
Innovation Solution
Incorporating a homopolymer with a predetermined structure at its terminal into the resin composition, specifically a block copolymer, to enhance the process margin by broadening the pitch variation range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a homopolymer of polystyrene or polymethyl methacrylate is added to the block copolymer, then the process margin is broadened, but the pitch difference remains narrow
Solution Approach 1:
The patent changes the chemical structure parameter of the homopolymer by introducing a specific terminal group (carboxyl, hydroxyl, or amine group) instead of using conventional homopolymers. This structural parameter change enables the homopolymer to interact specifically with the block copolymer, broadening the pitch variation range while maintaining process margin benefits.
Solution Approach 2:
The patent creates a composite resin composition combining block copolymer with a specifically structured homopolymer. The composite material exhibits enhanced pitch variation capabilities compared to either component alone, achieving both broadened process margin and improved pitch difference through synergistic interaction between the two polymer components.
2Adaptability or versatility
If multiple block copolymers are prepared for different pitch designs, then the process margin is broadened, but the device complexity increases
Solution Approach 1:
The patent develops a universal resin composition formulation that can achieve multiple pitch designs using a single block copolymer type. By adjusting the ratio of block copolymer to specifically structured homopolymer, the same composition system can produce different pitch patterns, eliminating the need to prepare multiple different block copolymer compounds.
Solution Approach 2:
The patent uses parameter changes in the homopolymer terminal group structure to control pitch characteristics. By selecting different terminal groups (carboxyl, hydroxyl, amine) or adjusting their concentration, the system can tune the pitch for different designs without changing the fundamental block copolymer structure, thereby reducing material complexity.
3Manufacturing precision
If the pitch variation range is narrowed, then the manufacturing precision is improved, but the adaptability to different pitch designs is reduced
Solution Approach 1:
The patent introduces dynamic adjustability to the resin composition system through the homopolymer with specific terminal groups. The composition can be dynamically adjusted by varying the homopolymer-to-block-copolymer ratio or selecting different terminal group types to achieve the desired pitch characteristics, providing both precision and flexibility.
Solution Approach 2:
The patent employs parameter changes in the homopolymer terminal group structure to independently control pitch variation. The specific terminal groups (carboxyl, hydroxyl, amine) interact with the block copolymer to enhance pitch difference, allowing precise pitch control while maintaining flexibility for different pitch designs through parameter adjustment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The addition of the homopolymer with a specific terminal structure significantly widens the pitch difference while maintaining equivalent aperture rates, thereby improving the process margin and flexibility in pattern formation.
Implementation Method 1
The block copolymers separate (phase-separate) into micro-regions due to repulsion between the mutually incompatible blocks
Implementation Method 2
a technique has been developed to form finer patterns by utilizing a phase-separated structure formed by directed self-assembly of block copolymers
Data Source
AI summary
A resin composition for forming a phase-separated structure, and a method for producing a structure having a phase-separated structure using the resin composition. The resin composition includes a block copolymer and a homopolymer, the block copolymer has a first block and a second block, the first block and the homopolymer each independently include a polymer having a repeating structure of a constituent unit represented by formula (b1), and at least one terminal of a main chain of the homopolymer has a structure I represented by formula (b2-I) or a structure II represented by formula (b2-II)


