Phase Shift Mask Light Shielding Region Width Compensation
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Solution Overview
Problem
Existing phase shift masks result in patterns with widths smaller than intended due to overexposure during the fabrication of array substrates, leading to narrower data lines and other features than desired.
Innovation Solution
A phase shift mask design with a wider light shielding region than the preset pattern width, where the compensation width is negatively correlated with the channel light transmitting portion's width, ensuring the actual pattern width matches the preset width by controlling the phase shifting and light shielding layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a phase shift mask with light shielding portion is used during exposure process, then the resolution of the pattern can be improved, but the actual pattern width becomes smaller than the preset width due to overexposure
Solution Approach 1:
The patent applies preliminary anti-action by designing the light shielding portion with a width that is intentionally larger than the desired pattern width. This preliminary design compensates for the expected overexposure effect during the exposure process, ensuring that the final pattern width matches the preset width despite the overexposure that occurs during manufacturing.
Solution Approach 2:
The patent changes the parameter of the light shielding portion width from being equal to the desired pattern width to being larger than the desired pattern width. This parameter change specifically adjusts the light shielding portion width to account for overexposure, transforming the exposure conditions to achieve accurate pattern width while maintaining the resolution benefits of using a phase shift mask.
2Manufacturing precision
If the light shielding region width is increased to compensate for overexposure, then the actual pattern width matches the preset width, but the mask structure becomes more complex
Solution Approach 1:
The patent applies local quality by making only the light shielding portion wider than the desired pattern width, while keeping other parts of the mask structure unchanged. This localized modification focuses the complexity only where needed for compensation, rather than redesigning the entire mask structure, thus minimizing overall device complexity while achieving the required manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents overexposure, maintaining the desired pattern width by adjusting the light shielding region's width relative to the channel light transmitting portion, thus ensuring accurate feature sizes in array substrates.
Implementation Method 1
the light passing through the phase shifting material produces a 180-degree phase change
Implementation Method 2
the light passing through the phase shifting material produces a 180-degree phase change. Because of the offset interference (that is, light interference is obstructed), the resolution of the pattern formed by the phase shift mask can be improved
Data Source
AI summary
A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion (02) on the substrate (01). The wiring light shielding portion (02) includes a light shielding region (021) and a phase shift region (022). In a direction perpendicular to the extending direction of the wiring light shielding portion (02) a width of the light shielding region (021) is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion (02).