Phosphonate-Terminated Brush Polymers for Sub-10 nm Directed Self-Assembly
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Solution Overview
Problem
Conventional lithography techniques face limitations in achieving sub-10 nm feature sizes due to aberrations, focus, proximity effects, and maximum achievable exposure wavelengths, while existing directed self-assembly methods require complex processes or reactive additives that can cause unwanted reactions and diffusion, and there is a need for materials that can form grafted polymer layers on metal substrates without plasma deposition or electrochemical methods.
Innovation Solution
Development of novel acrylate and styrene polymers with pendant phosphonate moieties that form selective polar or non-polar brush layers on metal substrates through spin coating, allowing for simple chemical bonding and avoiding reactive additives, and enabling directed self-assembly with block copolymers to achieve high-resolution patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography techniques are used, then manufacturing process is simple, but feature size resolution cannot achieve sub-10 nm due to aberrations, focus, and proximity effects
Solution Approach 1:
The patent introduces a neutral layer as an intermediary between the substrate and the block copolymer. This neutral layer with controlled surface energy enables the block copolymer to self-assemble in a perpendicular orientation, achieving sub-10 nm resolution without requiring complex lithography modifications. The neutral layer mediates the interaction between the substrate and polymer, allowing precise pattern formation through self-assembly rather than direct lithographic exposure.
Solution Approach 2:
The patent modifies surface energy parameters by applying a neutral layer with specific surface energy characteristics. This parameter change in surface energy enables the block copolymer to adopt a perpendicular orientation during self-assembly, which is critical for achieving sub-10 nm feature sizes. By controlling the surface energy parameter of the neutral layer, the system transitions from conventional lithography limitations to enhanced resolution capabilities.
2Manufacturing precision
If directed self-assembly methods are used to achieve sub-10 nm features, then manufacturing precision improves, but process complexity increases due to reactive additives and multiple processing steps
Solution Approach 1:
The patent extracts and eliminates the need for reactive additives from the self-assembly process. By using a neutral layer with controlled surface energy, the system achieves perpendicular block copolymer orientation without requiring plasma treatment, chemical grafting, or other reactive processing steps. This extraction of reactive components simplifies the overall process while maintaining sub-10 nm resolution capability.
Solution Approach 2:
The neutral layer is applied in advance before the block copolymer self-assembly process. This preliminary action of creating a surface with optimized energy characteristics prepares the substrate to guide perpendicular orientation of the polymer domains. By performing this preparatory step beforehand, the subsequent self-assembly proceeds more efficiently without requiring additional reactive processing steps.
3Strength
If grafted polymer layers are formed using plasma deposition or electrochemical methods, then adhesion strength improves, but process complexity and potential for unwanted reactions increase
Solution Approach 1:
The patent replaces complex plasma deposition or electrochemical processes with a simpler spin-coating method to form the neutral layer. This mechanical substitution uses centrifugal force and evaporation to deposit the polymer layer, eliminating the need for plasma reactors or electrochemical equipment. The resulting layer provides sufficient adhesion and surface energy control without the complexity and potential side reactions of the alternative methods.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution allows for the formation of high-resolution patterns on metal substrates with improved lithographic performance by enabling perpendicular orientation of block copolymer domains without complex processing steps, reducing pattern variation, and enhancing pattern resolution and CD control.
Implementation Method 1
novel acrylate and styrene polymers with pendant phosphonate moieties that form selective polar or non-polar brush layers on metal substrates through spin coating, allowing for simple chemical bonding
Implementation Method 2
compositions with a spin casting solvent which can selectively form polar or non-polar brush layers on metal substrates
Implementation Method 3
enabling directed self-assembly with block copolymers to achieve high-resolution patterns
Data Source
AI summary
The disclosed subject matter relates compounds of structure (I), and polymers of structure (II) having a polydispersity ranging from 1 to about 1.1, compositions comprising said polymers and a spin casting solvent, the process of forming a pinning layer selectively on metal with said composition and the process of using said pinning layers to affect chemoepitaxy directed self-assembly of an overlying block copolymer, and the subsequent process of pattern transfer of this self-assembled layer into a substrate by etching.