Phosphoric Acid Concentration via Heated Liquid Ejection
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Solution Overview
Problem
The existing etching process using phosphoric acid processing liquid is inefficient due to the prolonged time required to concentrate the phosphoric acid aqueous solution to a desired concentration, leading to reduced throughput in the etching process.
Innovation Solution
A substrate processing apparatus with a processing liquid generation part that includes a reservoir, circulation line, heater, and nozzle to efficiently concentrate the phosphoric acid aqueous solution by heating and ejecting it above the liquid level, promoting evaporation and concentration through a controlled gas flow and bubbling mechanism.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If phosphoric acid aqueous solution is concentrated by conventional heating methods, then the desired concentration is achieved, but the process time is prolonged
Solution Approach 1:
The invention utilizes the phase transition of water from liquid to vapor through rapid heating to concentrate the phosphoric acid aqueous solution. By heating the solution to a temperature where water evaporates rapidly while phosphoric acid remains in liquid phase, the concentration is achieved quickly without prolonged heating time
Solution Approach 2:
The system employs periodic heating and cooling cycles to concentrate the phosphoric acid aqueous solution. The heating phase rapidly evaporates water to increase concentration, followed by cooling phases that allow for controlled condensation and replenishment, creating an efficient periodic concentration process
2Productivity
If phosphoric acid aqueous solution is concentrated quickly, then throughput is improved, but concentration control precision deteriorates
Solution Approach 1:
The invention incorporates a feedback control system that continuously monitors the concentration of phosphoric acid in the aqueous solution and adjusts the heating power accordingly. When the desired concentration is reached, the system automatically reduces or stops heating, preventing over-concentration and ensuring precise concentration control while maintaining high throughput
Solution Approach 2:
The system dynamically adjusts heating parameters based on real-time concentration measurements. The heating power, duration, and intensity are continuously optimized during the concentration process, allowing rapid concentration while maintaining precise control over the final concentration level
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for rapid and efficient concentration of the phosphoric acid aqueous solution to a desired level, enhancing the etching process throughput by reducing the time needed to achieve the required concentration.
Implementation Method 1
a heater configured to heat the processing liquid
Implementation Method 2
a nozzle provided at a downstream side of the circulation line and has at least one ejection port formed to eject the processing liquid heated by the heater from above a liquid level of the processing liquid stored in the reservoir
Data Source
AI summary
There is provided a substrate processing apparatus including: a processing part configured to process a substrate with a processing liquid; and a processing liquid generation part configured to generate the processing liquid supplied to the processing part. The processing liquid generation part includes: a reservoir configured to store the processing liquid; a circulation line through which the processing liquid stored in the reservoir is circulated; a heater configured to heat the processing liquid; and a nozzle provided at a downstream side of the circulation line and has at least one ejection port formed to eject the processing liquid heated by the heater from above a liquid level of the processing liquid stored in the reservoir.