Solar Cell Phosphorus-Boron Oxide Mask for Longer Etching Windows
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Solution Overview
Problem
Conventional mask layers in solar cell production exhibit insufficient corrosion resistance, limiting the time window for processes like texturing and wrap-around removal, and affecting the yield of solar cells.
Innovation Solution
A phosphorous-boron co-doped silicon oxide layer is formed on the solar cell substrate, providing excellent corrosion resistance and serving as a mask layer to protect areas not requiring treatment, thereby extending the time window for processes such as texturing and wrap-around removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional mask layer is used, then the mask layer can be formed on the solar cell substrate, but the corrosion resistance is insufficient, resulting in a short time window for processes such as texturing or wrap-around removal
Solution Approach 1:
The patent changes the chemical composition parameters of the mask layer by co-doping silicon oxide with phosphorous and boron. This compositional modification significantly enhances the corrosion resistance of the mask layer, allowing it to withstand prolonged exposure to chemical solutions during texturing and wrap-around removal processes, thereby extending the available time window for these operations.
Solution Approach 2:
The patent creates a composite mask layer structure by combining silicon oxide with phosphorous and boron dopants. This composite material approach produces a mask layer with superior corrosion resistance compared to conventional single-component mask layers, enabling extended process time windows while maintaining structural integrity during wet chemical treatments.
2Productivity
If multiple procedures are used to form complex cell structures, then the conversion efficiency can be improved, but the process complexity increases and yield is affected due to insufficient mask layer performance
Solution Approach 1:
By modifying the compositional parameters of the mask layer through phosphorous-boron co-doping, the patent enables the mask layer to maintain its protective function for extended periods. This allows complex multi-step processes (texturing, wrap-around removal, etc.) to be performed sequentially without rushing, reducing process errors and improving yield while maintaining the ability to create complex cell structures for high conversion efficiency.
Solution Approach 2:
The patent applies the phosphorous-boron co-doped silicon oxide mask layer in advance before texturing and wrap-around removal processes. This preliminary protective action ensures that subsequent complex procedures can be performed methodically without time pressure, allowing proper formation of complex cell structures that improve conversion efficiency while maintaining high yield through reduced process errors.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The phosphorous-boron co-doped silicon oxide layer enhances the corrosion resistance, allowing for a prolonged processing time and improving the yield of solar cells.
Implementation Method 1
A phosphorous-boron co-doped silicon oxide layer is formed on the area B; wherein the first treatment includes one or more selected from a texturing process, an etching process, and a wrap-around removal process
Data Source
AI summary
In one aspect, a manufacturing method for a solar cell includes the following steps: providing a solar cell substrate, the solar cell substrate comprising a region A on which a first processing needs to be performed and a region B on which the first processing does not need to be performed; and forming on the region B a phosphorus-boron co-doped silicon oxide layer; and performing the first processing on the region A, the first processing comprising one or more of texturing processing, etching processing and wrapping-plating removal processing.