Photo Alignment Process for LCD Substrates

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Solution Overview

Problem

Conventional photo alignment processes in LCD manufacturing are inefficient, leading to increased tact time and equipment costs due to the need for multiple photo alignment light source systems and extensive substrate handling, which decreases product competitiveness.

Innovation Solution

A display manufacturing method and photo alignment process that utilizes a conveying apparatus to move substrates through a light source module, allowing opposite or coordinated movement during exposure processes, thereby optimizing the use of the light source module and reducing tact time and equipment costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple photo alignment light source systems are added to increase production capacity, then productivity increases, but device complexity and equipment cost increase

Engineering Contradiction:
Improveproduction capacityVSAvoidequipment cost
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent combines multiple substrate exposures into a single photo alignment light source system by implementing dual-stage exposure. The first exposure aligns liquid crystal molecules in an initial state, and the second exposure further aligns them after substrate transfer, achieving the function of multiple light source systems through one integrated system with sequential operation.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent introduces dynamic substrate transfer between stages, where substrates are moved from a first substrate stage to a second substrate stage between exposures. This dynamic repositioning allows a single light source system to effectively serve multiple exposure functions by changing the spatial configuration of substrates relative to the light source.

Inventive Principle:
Principle #15Dynamics

2Device complexity

If conventional single light source system is used, then device complexity is reduced, but productivity decreases due to non-exposure operation time

Engineering Contradiction:
Improveequipment costVSAvoidproduction capacity
Core Design Contradiction:
Device complexityVSProductivity

Solution Approach 1:

The patent ensures continuous useful action by eliminating idle time in the exposure process. While substrates are being transferred between stages, the light source system remains ready for the next exposure operation. The dual-stage configuration allows one substrate to be exposed while another is being positioned, maintaining continuous productive operation without non-exposure downtime.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The patent performs preliminary alignment exposure on the first substrate stage before substrate transfer. This preliminary action prepares the liquid crystal molecules in advance, so that when substrates are transferred to the second stage, the final exposure can be performed immediately without waiting for substrate preparation, thus reducing overall tact time.

Inventive Principle:
Principle #10Preliminary action

3Productivity

If dual-stage substrate transfer is implemented, then productivity increases by reducing non-exposure time, but device complexity increases

Engineering Contradiction:
Improveexposure efficiencyVSAvoidsubstrate handling system
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent segments the substrate handling process into two distinct stages: first substrate stage for initial exposure and second substrate stage for final exposure. This segmentation allows independent optimization of each stage and enables parallel operations where substrate transfer occurs while light exposure is being performed on other substrates, improving overall efficiency without requiring complex integrated handling.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively decreases the tact time of the photo alignment process, reduces equipment costs, and enhances product competitiveness by optimizing the use of the light source module and improving substrate handling efficiency.

Implementation Method 1

an ultraviolet source is used to illuminate a polymer thin film (alignment film) of a substrate so that the polymer structure of the thin film's surface can generate uneven photopolymerization, photoisomerization or photocleavage

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

the polymer structure of the thin film's surface can generate uneven photopolymerization, photoisomerization or photocleavage

Methodology Applied
Scientific EffectPhotoisomerization:

Implementation Method 3

the polymer structure of the thin film's surface can generate uneven photopolymerization, photoisomerization or photocleavage

Methodology Applied
Scientific EffectPhotocleavage:

Implementation Method 4

The light emitting element emits a polarized light

Methodology Applied
Scientific EffectPolarisation: Polarisation

Data Source

PatentUS9690216B2Display manufacturing method and photo alignment process
Publication Date: 2017.06.27 INNOLUX CORP
  • US9690216B2 patent drawing
  • US9690216B2 patent drawing
  • US9690216B2 patent drawing

AI summary

A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.