Photo-alignment Apparatus Using Multilayer Splitter for Simultaneous Dual-Axis Exposure
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Solution Overview
Problem
Conventional photo-alignment apparatuses for liquid crystal displays require significant factory space and longer manufacturing times to form two alignment directions, as they necessitate substrate rotation and longer processing paths.
Innovation Solution
A photo-alignment apparatus utilizing a multilayer splitter to split a unitary light source into two beams with equal intensity, which are projected onto a substrate at different angles using masks with adjustable transmission portions, allowing simultaneous formation of two alignment directions on a single substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If substrate rotation is used to form two alignment directions, then two alignment directions can be formed on the substrate, but the manufacturing time increases and factory space requirements increase
Solution Approach 1:
The patent divides the single light source into two separate light beams using a beam splitter, allowing simultaneous formation of two alignment directions without substrate rotation. The beam splitter segments the optical path to create multiple exposure zones on the substrate at different angles concurrently.
Solution Approach 2:
The patent introduces a spatial dimension by using light beams incident at different angles (e.g., +45 degrees and -45 degrees) to create multiple alignment directions simultaneously. This dimensional approach in the optical path eliminates the need for temporal separation through substrate rotation.
2Adaptability or versatility
If substrate rotation is used to form two alignment directions, then two alignment directions can be formed on the substrate, but the factory space requirements increase
Solution Approach 1:
The patent merges the function of multiple exposure operations into a single simultaneous operation by using a beam splitter to create two light beams from one light source. Both alignment directions are formed in one exposure cycle, reducing the space needed for substrate rotation mechanisms and multiple exposure stations.
Solution Approach 2:
By utilizing angular separation in the optical path rather than spatial separation through substrate rotation, the patent reduces the physical footprint of the equipment. The different incident angles allow multiple alignment directions to be created within the same exposure zone without requiring additional rotation space.
3Ease of manufacture
If a single light source is used with substrate rotation, then alignment can be achieved, but the processing speed decreases
Solution Approach 1:
The beam splitter segments the single light source into two independent light beams that can simultaneously expose different regions of the substrate at different angles. This parallel processing approach doubles the effective throughput without requiring multiple light sources, maintaining ease of manufacture while improving productivity.
Solution Approach 2:
The patent enables continuous exposure of the substrate as it passes through the exposure zone, with both light beams acting simultaneously throughout the exposure process. This eliminates the intermittent nature of sequential exposure and rotation, maintaining continuous productive action throughout the manufacturing cycle.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces manufacturing time and factory space requirements, enabling more efficient production of liquid crystal displays with aligned substrates, thereby lowering production costs.
Implementation Method 1
The polarization plate receives the unpolarized light and converts the unpolarized light to a polarized light
Implementation Method 2
The multilayer splitter receives the polarized light and splits the polarized light into a first light beam and a second light beam
Implementation Method 3
the first light beam and the second light beam passing through the two different transmission portions are projected on the photo-alignment area
Data Source
AI summary
A photo-alignment apparatus is provided, which includes an exposure machine, at least one mask and a photo-alignment area. The exposure machine includes a light source, a polarization plate, and a multilayer splitter. The light source emits an unpolarized light. The polarization plate receives the unpolarized light and converts the unpolarized light into a polarized light. The multilayer splitter split the polarized light into a first light beam and a second light beam. The mask includes at least two transmission portions which allow the first and second light beams to be transmitted therethrough and be projected onto the photo-alignment area for exposure thereto.