Photo-Curable Composition for Dry Etching and Thermal Stability
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Solution Overview
Problem
Photo-curable compositions used in nanoimprinting techniques often lack sufficient dry etching resistance and thermal stability, which are essential for processing semiconductor devices and MEMS, where high yield and precision are required.
Innovation Solution
A photo-curable composition comprising a polymerizable compound, a photopolymerization initiator, and optional flame retarders or flame-retardant polymerizable compounds, which provides high dry etching resistance and thermal stability by incorporating components like brominated phenyl groups or phosphate ester groups, enhancing the mechanical strength and chemical stability of the cured film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional photo-curable composition is used for nanoimprinting, then the composition can be easily cured with light, but the dry etching resistance and thermal stability are insufficient
Solution Approach 1:
The patent uses composite materials by combining polymerizable compounds with specific flame retardant structures (brominated phenyl groups, phosphate ester groups) into the photo-curable composition. This creates a multi-functional material that simultaneously provides curing capability, dry etching resistance, and thermal stability, resolving the contradiction between reliability and manufacturing simplicity
Solution Approach 2:
The patent changes the chemical composition parameters of the photo-curable composition by incorporating flame retardant compounds with specific molecular structures (brominated phenyl groups, phosphate ester groups). This parameter change transforms the composition from conventional to advanced, achieving both high dry etching resistance and thermal stability while maintaining ease of use
2Reliability
If conventional photo-curable composition is used, then the composition can be applied broadly, but thermal stability during dry etching is insufficient
Solution Approach 1:
The patent creates a composite photo-curable composition that integrates flame retardant compounds with polymerizable compounds. The composite structure provides inherent thermal stability through the flame retardant mechanisms (radical scavenging, char formation) while maintaining the curing functionality, thus improving thermal stability without significantly increasing device complexity
Solution Approach 2:
The patent applies local quality by incorporating flame retardant structures specifically into the molecular architecture of the polymerizable compounds. The brominated phenyl groups and phosphate ester groups are positioned within the molecular structure to provide localized thermal protection where needed during dry etching, achieving high thermal stability with controlled composition complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved dry etching resistance and thermal stability, enabling efficient processing of substrates with high precision and yield, particularly in semiconductor device fabrication and MEMS applications.
Implementation Method 1
a photopolymerization initiator (B)
Implementation Method 2
a photo-curable composition comprising a polymerizable compound, a photopolymerization initiator
Data Source
AI summary
An object is to provide a photo-curable composition having high dry etching resistance and high thermal stability. A photo-curable composition includes at least a polymerizable compound (A) and a photopolymerization initiator (B), and further includes at least one of a flame retarder (E) and a flame-retardant polymerizable compound (F).