Photo-curable Imprint Composition for High Mold Filling
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Solution Overview
Problem
Conventional photo-curable compositions for imprints face issues with poor dry-etching durability, high viscosity, and low mold filling ratios, leading to pattern defects during the release from molds.
Innovation Solution
A photo-curable composition with a viscosity of 15 mPa·s or less, an Ohnishi parameter of 3.0 or smaller, and a crosslink density of 0.6 mmol/cm³ or higher, comprising a monofunctional monomer, a polyfunctional monomer, and a photo-polymerization initiator, along with a fluorine-containing compound, to enhance mold filling and etching durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional photo-curable compositions for imprints are used, then the composition can be applied for imprinting process, but the dry-etching durability is poor
Solution Approach 1:
The patent changes the chemical composition parameters by introducing fluorine-containing compounds and gas generating agents, and by controlling the ratio of polymerizable compounds with different functional groups. This modifies the chemical properties to achieve both high dry-etching durability and appropriate composition stability.
Solution Approach 2:
The patent creates a composite photo-curable composition containing multiple components: fluorine-containing compounds, gas generating agents, and specific polymerizable compounds in controlled ratios. This composite structure provides synergistic effects that improve etching durability while maintaining composition stability.
2Manufacturing precision
If the viscosity of photo-curable composition is reduced to improve mold filling, then the mold filling ratio increases, but the pattern may fracture due to stress when released from mold
Solution Approach 1:
The patent optimizes the viscosity parameter by selecting specific polymerizable compounds and controlling their ratios. The composition achieves low viscosity (15 mPa·s or smaller) for good mold filling while the crosslinking structure provides sufficient strength to prevent pattern fracture during release.
Solution Approach 2:
The patent performs preliminary crosslinking preparation by incorporating gas generating agents and fluorine-containing compounds that create a robust network structure before mold release. This preliminary structural reinforcement ensures the pattern can withstand release stress even with low viscosity formulation.
3Reliability
If crosslink density is increased to improve etching durability, then the dry-etching durability improves, but the viscosity of the composition increases
Solution Approach 1:
The patent carefully balances the crosslink density parameter by controlling the ratio of polyfunctional monomers to monofunctional monomers. The crosslink density is optimized to achieve high etching durability while the low molecular weight compounds and fluorine-containing additives keep the viscosity low for good mold filling.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high mold filling ratios and low defect density during mold release, providing improved dry-etching durability and pattern integrity.
Implementation Method 1
A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator
Data Source
AI summary
To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger;Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.