Photo-cured Layer Edge Extrusion Control via Vapor Pressure Gradient
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Solution Overview
Problem
In drop-on-demand imprint lithography, there is a challenge in accelerating resist spreading on substrates while controlling extrusions at the edge regions, which leads to unwanted defects.
Innovation Solution
A method involving the application of a first photocurable composition with a lower vapor pressure in the center region and a second photocurable composition with a higher vapor pressure in the edge region, where the second composition has at least two times greater vapor pressure, to minimize extrusions by photo-curing and removing a template or superstrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a resist material is designed to fill wafer features at a fast spreading time, then the productivity is improved, but extrusions are formed at the edge regions causing defects
Solution Approach 1:
The patent applies different photocurable compositions with different vapor pressures to different regions of the substrate. The first composition (lower vapor pressure) is applied to the center region while the second composition (higher vapor pressure) is applied to the edge region. This local differentiation allows fast spreading in the center while preventing extrusions at the edges, resolving the contradiction between productivity and manufacturing precision.
2Manufacturing precision
If the second photocurable composition has a higher vapor pressure to prevent extrusions, then the manufacturing precision is improved, but the composition complexity increases
Solution Approach 1:
The patent changes the vapor pressure parameter of the photocurable composition to solve the extrusion problem. By selecting compositions with different vapor pressure characteristics for different regions, the patent achieves extrusion prevention while keeping the compositional changes manageable and focused on a single physical parameter.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for fast resist filling in the center region while preventing excessive extrusions in the edge region, maintaining a balanced etch rate and minimizing unwanted elevations in the photo-cured layer.
Implementation Method 1
the second photocurable composition has a higher vapor pressure than the first photocurable composition
Implementation Method 2
photo-curing the first photocurable composition and the second photocurable composition
Data Source
AI summary
A method of forming a photo-cured layer on a substrate can include applying a first photocurable composition overlying a first region of the substrate and a second photocurable composition overlying a second region of the substrate and photo-curing the applied compositions, wherein the first region is a center region of the substrate and the second region is an edge region of the substrate, and the second photocurable composition has a higher vapor pressure than the first photocurable composition. The method can have the advantage that the forming of an extrusion within the edge region of the photo-cured layer can be avoided or being kept very low.