Photoacid Resin Composition for 30 Nm Pattern Roughness Control
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Solution Overview
Problem
Existing actinic ray-sensitive or radiation-sensitive resin compositions struggle to achieve high levels of line width roughness (LWR) and resolving power in the formation of ultrafine patterns with line widths or space widths of 30 nm or less.
Innovation Solution
An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin that increases polarity upon acid action, combined with a compound that generates acid upon irradiation, represented by General Formula (I), which integrates both photoacid generator and acid diffusion control agent functionalities within a single molecule, ensuring uniform distribution and moderate acid strength.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional actinic ray-sensitive or radiation-sensitive resin compositions are used, then the basic lithography process can be performed, but the line width roughness and resolving power are insufficient for ultrafine patterns with line widths of 30 nm or less
Solution Approach 1:
The patent combines multiple functional groups into a single resin molecule: a photoacid generator group (e.g., sulfonium or oxonium salt), an acid diffusion control group (e.g., carboxyl or hydroxyl group), and a polarity-modifying group. This integration allows the resin to simultaneously generate acid, control acid diffusion, and modulate polarity in response to acid action, thereby achieving both high resolving power and low line width roughness for ultrafine patterns of 30 nm or less while maintaining versatility across different lithography processes
Solution Approach 2:
The patent employs a composite resin structure comprising multiple functional moieties within a single molecular framework. The resin includes a base structure with specific functional groups: photoacid generator (e.g., triphenylsulfonium salt), acid diffusion control groups (e.g., carboxyl at position 2 and hydroxyl at position 4), and aromatic rings with electron-donating or electron-withdrawing substituents. This composite molecular design enables synergistic effects where each group contributes to specific performance aspects, achieving superior resolving power and line width control for ultrafine pattern formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enhances both roughness performance and resolving power in forming ultrafine patterns, stabilizing pattern width and improving roughness, particularly for patterns with widths of 30 nm or less.
Implementation Method 1
a compound that generates an acid upon irradiation with actinic rays or radiation
Data Source
AI summary
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.