Photocathode Film Layout for Multi-Beam Electron Throughput
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Solution Overview
Problem
Increasing the number of electron beamlets in electron-beam devices, such as scanning electron microscopes, to enhance throughput is challenging due to issues with homogenous angular intensity distribution, field curvature, astigmatism, and distortion.
Innovation Solution
An electron-beam device that includes a photocathode film with a pattern of emission and non-emission regions, illuminated from the back side by a laser, to emit multiple electron beamlets, which are then extracted and controlled using electrodes to achieve desired shapes and directions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the emission angle of the electron source is increased to create more beamlets, then the number of beamlets increases and throughput improves, but the angular intensity distribution becomes less homogenous
Solution Approach 1:
The patent divides the electron source into multiple discrete emission regions on the photocathode film, each corresponding to a specific beamlet. By illuminating the back side of the photocathode with a laser, electrons are emitted at controlled locations and angles, creating multiple beamlets with homogeneous angular intensity distribution while maintaining high throughput
Solution Approach 2:
Instead of controlling the front side of the photocathode as in conventional approaches, the patent illuminates the back side of the photocathode film with a laser. This inverted approach allows for better control of electron emission angles and homogeneous angular intensity distribution across multiple beamlets
2Productivity
If the number of beamlets is increased to improve throughput, then the field of view increases, but field curvature, astigmatism, and distortion increase
Solution Approach 1:
The patent applies different properties to different regions of the photocathode film, with each emission region optimized for its specific location and angle. This allows each beamlet to maintain high quality with minimal aberrations while collectively providing a large field of view and high throughput
Solution Approach 2:
The patent controls emission parameters (angle, position, energy) by varying the illumination conditions on the back side of the photocathode. By changing these parameters across different emission regions, the system achieves both large field of view and high image quality with minimal distortion
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the creation of multiple electron beamlets with controlled shapes and directions, improving the throughput and inspection capabilities of electron-beam devices while minimizing distortions and aberrations.
Implementation Method 1
The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser
Data Source
AI summary
An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.


