Photocrosslinkable Resin Composition for Alkaline-Developable Patterning
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Solution Overview
Problem
Existing resins used in organic electronic devices are not photocrosslinkable at low light exposure intensity and are not soluble in alkaline solutions, leading to performance degradation and limitations in substrate selection.
Innovation Solution
A resin with a specific structure containing a photocrosslinkable group and units with fluorine, acidic, and hydrophilic functional groups, allowing solubility in alkaline solutions and insolubility upon photocrosslinking at low light exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a resin is used that is soluble in fluorine-based solvent, then liquid-repellency is achieved, but the resin is not photocrosslinkable
Solution Approach 1:
The patent uses a composite resin system combining a fluorine-based polymer (providing liquid-repellency) with a photocrosslinkable polymer (providing photocurability). This composite approach allows both desired properties to coexist: the fluorine-based component delivers liquid-repellency while the photocrosslinkable component enables pattern formation through photocuring.
2Reliability
If a resin with photocrosslinkable group is used, then photocrosslinking can be carried out, but the resin is not soluble in alkaline solution
Solution Approach 1:
The patent introduces acidic functional groups (carboxyl or sulfonic acid groups) at specific locations within the polymer chain of the photocrosslinkable polymer. This local modification of chemical properties allows the polymer to dissolve in alkaline solutions through neutralization reactions, while the photocrosslinkable groups remain functional for pattern formation.
3Duration of action of stationary object
If high-temperature heat treatment is used for curing, then the composition can be cured, but performance of electronic device decreases and substrate selection is limited
Solution Approach 1:
The patent replaces thermal curing (heat treatment) with photocuring using photocrosslinkable groups that react upon light irradiation. This substitution eliminates the need for high-temperature processing, thereby preserving device performance and expanding substrate options to include temperature-sensitive materials and plastic substrates.
4Reliability
If a resin is used that requires high light exposure intensity for photocrosslinking, then photocrosslinking can occur, but exposure time increases and productivity decreases
Solution Approach 1:
The patent modifies the chemical structure of the photocrosslinkable groups and selects appropriate phot initiators to enhance light absorption efficiency and reaction kinetics. This allows effective photocrosslinking at lower light exposure intensities, significantly reducing exposure time and improving manufacturing productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resin achieves liquid-repellency and solubility in alkaline solutions, preventing performance degradation and enabling efficient pattern formation in electronic devices.
Implementation Method 1
a repeating unit that is represented by Formula (1) below including a photocrosslinkable group
Data Source
Figure 1~2
AI summary
An object of an aspect of the present invention is to provide a resin that has liquid-repellency and high solubility in an alkaline solution, and becomes insoluble in the solvent by photocrosslinking at low light exposure intensity. A resin in accordance with an aspect of the present invention contains: a repeating unit that is represented by Formula (1) including a photocrosslinkable group; and one or more units selected from the group consisting of a repeating unit that includes a fluorine atom, a repeating unit that includes an acidic functional group and a repeating unit that includes a hydrophilic functional group, where R1 represents hydrogen or methyl, L1 represents a single bond or a linking group, A represents a linking group, and R2 through R6 represent one selected from the group consisting of hydrogen, halogen, alkyl, alkyl halide, alkoxy, aryl, aryloxy, cyano, and amino.