Photocurable Composition for Fine Pattern Transfer
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Solution Overview
Problem
Current photocurable compositions used in nanoimprint methods for forming fine patterns on optical members and semiconductor apparatus face challenges in achieving both high mechanical strength and effective mold release characteristics, leading to difficulties in precisely transferring reverse patterns due to issues with mold release agents and low durability of cured products.
Innovation Solution
A photocurable composition comprising an aromatic or alicyclic compound with (meth)acryloyloxy groups, a fluorine-containing compound with carbon-carbon unsaturated double bonds, and a photopolymerization initiator, along with optional additives like fluorinated surfactants and fluoropolymers, which are formulated to provide enhanced mold release characteristics and mechanical strength, allowing for precise pattern transfer and improved durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a mold release agent is applied to the mold surface, then the cured product can be separated from the mold, but the pattern transfer precision deteriorates due to the thickness and uneven coating of the release agent
Solution Approach 1:
The invention extracts and eliminates the mold release agent from the system by incorporating fluorinated compounds directly into the photocurable composition. This allows the cured product to naturally release from the mold without requiring a separate release agent layer, thereby maintaining pattern transfer precision while achieving effective mold release.
Solution Approach 2:
The fluorinated compounds act as an intermediary between the photocurable composition and the mold surface. These compounds provide mold release characteristics through their chemical structure and properties, serving as a built-in release mechanism that does not compromise pattern fidelity.
2Ease of operation
If a fluorinated monomer and fluorinated surfactant or fluoropolymer are used to achieve mold release characteristics, then the cured product can be released from the mold, but the mechanical strength deteriorates
Solution Approach 1:
The invention changes the chemical composition parameters by using fluorinated compounds with specific structural characteristics (carbon-carbon unsaturated double bonds excluding the compound of formula (A)). This allows optimization of both mold release characteristics and mechanical strength by selecting appropriate fluorinated compounds and controlling their content within specific ranges (5-40 mass%).
Solution Approach 2:
The invention creates a composite photocurable composition combining compound (A) with fluorinated compound (B) and compound (C). This composite system achieves synergistic effects where the fluorinated compound provides mold release characteristics while the combination maintains or enhances mechanical strength compared to using fluorinated monomers alone.
3Ease of manufacture
If conventional photocurable compositions are used, then the curing process is simple, but the durability and pattern shape maintenance deteriorate for fine patterns at the nano level
Solution Approach 1:
The invention changes the chemical composition parameters by incorporating fluorinated compounds with specific structures and controlling the ratios of different components within defined ranges. This enhances the durability and pattern shape maintenance of cured products while preserving the simplicity of the photopolymerization curing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the production of molded products with excellent mold release characteristics and mechanical strength, ensuring precise transfer of fine patterns and maintaining durability, addressing the limitations of existing compositions.
Implementation Method 1
irradiating the photocurable composition with light to cure the photocurable composition thereby to form a fine pattern on the surface of the substrate
Data Source
AI summary
To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface.A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.