Photocurable Composition with Fluorinated Hydrogen Donors for Low Mold Release

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Solution Overview

Problem

The photo-(nano)imprint method has low productivity due to high mold releasing force, leading to defects in patterns and degradation of alignment accuracy, and existing techniques do not adequately improve photocuring rates or reduce mold releasing force effectively.

Innovation Solution

A photocurable composition comprising a polymerizable compound, a photopolymerization initiator, and a hydrogen donor represented by general formula (1), which includes an alkyl group substituted with fluorine, an oxyalkylene group, and a nitrogen atom, to enhance photocuring sensitivity and reduce mold releasing force.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a photo-(nano)imprint method with long irradiation step is used, then the photocuring is more complete, but the productivity is low

Engineering Contradiction:

Improvephotocuring completenessVSAvoidproductivity

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

The patent changes the chemical composition parameters of the photocurable composition by adding specific hydrogen donors (amines with electron-donating groups) to accelerate the photopolymerization reaction rate, enabling complete curing in shorter irradiation times and thus improving productivity while maintaining curing completeness

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent introduces hydrogen donors as intermediary substances that mediate the photopolymerization process by donating electrons to the polymerization reaction, thereby accelerating the curing rate and reducing the required irradiation time without compromising the completeness of curing

Inventive Principle:

Principle #24Intermediary (Mediator)

2Force

If large force is applied to separate the mold from the cured resist, then the mold releasing force is sufficient, but defects in the pattern and degradation of alignment accuracy occur

Engineering Contradiction:

Improvemold releasing forceVSAvoidpattern quality and alignment accuracy

Core Design Contradiction:

ForceVSManufacturing precision

Solution Approach 1:

The patent introduces a surfactant as an intermediary substance that forms a releasing layer between the mold and the cured resist, reducing the adhesion force and enabling easy mold release with small force, thereby preventing pattern defects and alignment accuracy degradation

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent changes the surface energy parameters by adding surfactants with specific hydrophobic and hydrophilic groups, modifying the interfacial properties between the mold and resist to reduce adhesion and enable easy release while maintaining pattern quality

Inventive Principle:

Principle #35Parameter changes

3Force

If a fluorine-based surfactant is added to decrease the mold releasing force, then the release is easier, but the photocuring rate needs further improvement

Engineering Contradiction:

Improvemold releasing forceVSAvoidphotocuring rate

Core Design Contradiction:

ForceVSProductivity

Solution Approach 1:

The patent creates a composite photocurable composition by combining surfactants for mold release with hydrogen donors for photocuring acceleration, achieving both low mold releasing force and high photocuring rate through the synergistic effect of multiple functional components

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent optimizes the concentration parameters of both surfactants and hydrogen donors in the composition to achieve the right balance between mold releasing force and photocuring rate, ensuring both easy release and high productivity

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves high sensitivity and low mold releasing force, enabling efficient production of patterned films, optical components, circuit boards, and electronic components with improved productivity and reduced defects.

Implementation Method 1

a photopolymerization initiator, and a hydrogen donor

Methodology Applied

Scientific EffectPhotopolymerisation: Photopolymerisation

Implementation Method 2

a hydrogen donor represented by general formula (1), which includes an alkyl group substituted with fluorine, an oxyalkylene group, and a nitrogen atom, to enhance photocuring rates

Methodology Applied

Scientific EffectHydrogen donation:

Implementation Method 3

a technique that can further decrease the mold releasing force from the mold is in demand

Methodology Applied

Scientific EffectSurfactant effect: Surfactant

Data Source

PatentUS9593170B2Compound, photocurable composition, and methods for producing patterned film, optical component, circuit board, electronic component by using the photocurable composition, and cured product

Publication Date: 2017.03.14 CANON KK

AI summary

A compound that increases the photocuring rate of a photocurable composition and reduces the force for releasing a cured product from a mold is provided.A compound is represented by general formula (1):where Rf represents an alkyl group at least part of which is substituted with fluorine, RO represents an oxyalkylene group or a repeated structure of an oxyalkylene group, N represents a nitrogen atom, RA represents an alkyl group, and RB represents an alkyl group or a hydrogen atom.