Photocurable Composition Fluorine Surfactant Mold Release
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Solution Overview
Problem
The UV nanoimprint method for producing resist films with predetermined patterns faces challenges in reducing the mold release force, which can lead to defects and reduced positioning accuracy due to high forces required for mold release, and existing solutions, such as using photosensitive gas generating agents, suffer from low productivity due to lengthy light irradiation times.
Innovation Solution
A photocurable composition incorporating a polymerizable compound, photopolymerization initiator, photosensitive gas generating agent, and a gas generation promoter with a fluorine atom-containing surfactant that accelerates gas aggregation at the interface between the mold and the photocurable composition, reducing the mold release force and enhancing productivity by shortening the light irradiation time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Force
If a photosensitive gas generating agent is used to reduce mold release force, then the mold release force is reduced, but the light irradiation time becomes long and productivity decreases
Solution Approach 1:
A fluorine atom-containing surfactant is introduced as an intermediary substance that accumulates at the interface between the photocurable composition and the mold. This surfactant acts as a mediator that promotes gas aggregation from the photosensitive gas generating agent toward the interface, thereby enhancing the efficiency of mold release force reduction and allowing for shorter light irradiation times.
Solution Approach 2:
The invention changes the physical and chemical parameters of the system by adding a fluorine atom-containing surfactant with specific properties (free of polymerizable substituents). This surfactant modifies the interfacial characteristics and gas aggregation behavior, enabling faster gas accumulation at the interface and reducing the required light irradiation time while maintaining effective mold release force reduction.
2Quantity of substance
If light irradiation is performed for a long time to generate gas, then gas generation is sufficient, but productivity is reduced
Solution Approach 1:
The fluorine atom-containing surfactant serves as an intermediary that directs and accelerates gas aggregation toward the mold interface. This mediator effect ensures that gas is efficiently concentrated where it is needed most, reducing the total light irradiation time required to achieve sufficient gas generation for mold release.
Solution Approach 2:
The surfactant is pre-added to the photocurable composition before light irradiation, so that it is already positioned at the interface and ready to promote gas aggregation. This preliminary preparation enables faster gas accumulation during light irradiation, thereby improving productivity without compromising gas generation effectiveness.
3Force
If high mold release force is applied, then the mold can be released, but defects occur and positioning accuracy is reduced
Solution Approach 1:
The fluorine atom-containing surfactant acts as a protective intermediary at the mold-resist interface. By promoting efficient gas aggregation, it enables mold release with lower forces, thereby preventing substrate displacement and maintaining positioning accuracy while still achieving successful mold release.
Solution Approach 2:
The invention converts the potential harm of high mold release forces (which cause defects and positioning errors) into a beneficial process by using the surfactant-mediated gas aggregation. The gas pressure, instead of causing damage, is channeled efficiently through the surfactant layer to achieve clean mold release with minimal force, thereby preserving manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution effectively reduces the mold release force and improves productivity by facilitating faster gas aggregation at the interface, allowing for efficient pattern formation with reduced defects and enhanced positioning accuracy.
Implementation Method 1
a photopolymerization initiator; curing the photocurable composition with light
Implementation Method 2
a photosensitive gas generating agent that generates a gas through light stimulation
Implementation Method 3
a gas generation promotor that increases an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, in which the gas generation promotor includes a fluorine atom-containing surfactant
Data Source
AI summary
A photocurable composition of the present invention to be used for manufacturing a film with high productivity is a photocurable composition to be used for manufacturing a film having a predetermined pattern shape by curing the photocurable composition with light under a state where the photocurable composition is brought into contact with a mold having concavo-convex on a surface thereof, the photocurable composition including: a polymerizable compound; a photopolymerization initiator; a photosensitive gas generating agent for generating a gas through light stimulation; and a gas generation promotor for increasing an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, in which the gas generation promotor includes a fluorine atom-containing surfactant that is free of a polymerizable substituent.