Photocurable Composition for Imprint in Condensable Gas Atmosphere
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Solution Overview
Problem
The use of condensable gases in photo-imprint techniques often leads to pattern destruction and defects in the photocured products due to the presence of bubbles, which are not effectively removed.
Innovation Solution
A photocurable composition comprising a polymerizable compound and a photopolymerization initiator, with specific properties that allow for the formation of a photocured film with a reduced modulus of at least 2.30 GPa when exposed to light in a condensable gas atmosphere, minimizing defects and ensuring pattern integrity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If condensable gas is used in photo-imprint to accelerate bubble disappearance, then infiltration speed is improved, but pattern destruction and defects occur
Solution Approach 1:
The patent changes the physical-chemical parameters of the photocurable composition by specifying a reduced modulus of at least 2.30 GPa and particular compositional ratios (5-50 wt% polymerizable compound, 0.1-10 wt% photopolymerization initiator). These parameter changes enable the composition to maintain pattern integrity while achieving effective bubble removal in condensable gas atmosphere, resolving the contradiction between infiltration speed and pattern reliability.
2Manufacturing precision
If resist is infiltrated into gaps and recesses to fill them, then filling ability is improved, but bubbles remain trapped causing defects
Solution Approach 1:
The patent utilizes phase transition of the condensable gas (from gas to liquid) during the imprint process. The condensable gas condenses during resist infiltration, accelerating bubble disappearance and enabling complete filling of gaps and recesses without trapped bubbles, thus resolving the contradiction between filling ability and bubble elimination.
3Reliability
If photocurable composition is cured in condensable gas atmosphere, then bubble removal is accelerated, but pattern destruction occurs
Solution Approach 1:
The patent creates a composite system combining the photocurable composition with condensable gas atmosphere. The specific formulation (polymerizable compound, photopolymerization initiator, and specified ratios) acts as a composite material that leverages the benefits of condensable gas for bubble removal while maintaining pattern quality through controlled physical-chemical properties (reduced modulus ≥2.30 GPa).
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of photocured films with substantially no defects, suitable for producing optical, circuit, and electronic components, even in gaseous atmospheres containing condensable gases, by controlling the reduced modulus and ensuring precise pattern transfer.
Implementation Method 1
a photopolymerization initiator component (B)... a photocurable composition for imprint in a condensable gas atmosphere... formed by exposing the photocurable composition for imprint to light
Implementation Method 2
a condensable gas that condenses by a capillary pressure generated by infiltration of a resist into the gaps between a substrate and a mold or the recesses on the mold
Data Source
AI summary
The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1):a value ECG of greater than or equal to 2.30 GPa,where ECG denotes the reduced modulus (GPa) of a photocured film prepared by exposing the photocurable composition for imprint to light at an exposure dose of 200 mJ/cm2 in an atmosphere containing a condensable gas in a concentration of 90% by volume or more.