Photocurable Composition Reducing Mold Releasing Force
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Solution Overview
Problem
The existing photo-nanoimprint method for forming resist films with predetermined patterns faces challenges in reducing mold releasing force, leading to potential defects and decreased productivity due to high mold releasing forces and lengthy light irradiation steps, even with the use of photosensitive gas generating agents.
Innovation Solution
A photocurable composition comprising a polymerizable compound, a photopolymerization initiator, and a photosensitive gas generating agent with an alkylene oxide chain, which generates gas upon light irradiation to reduce mold releasing force and enhance productivity by uniformly dispersing the gas generating agent without phase separation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Force
If a photosensitive gas generating agent is used to reduce mold releasing force, then the mold releasing force is reduced, but the light irradiation time becomes long and productivity decreases
Solution Approach 1:
The patent changes the chemical structure parameters of the gas generating agent by introducing alkylene oxide chains with specific lengths (1-6 chains) and controlling the balance between gas generating groups and alkylene oxide chains. This optimization allows the agent to generate sufficient gas for mold release while reducing the light irradiation time required, thereby improving productivity.
Solution Approach 2:
The patent creates a composite photocurable composition by combining the photosensitive gas generating agent with specific polymerizable compounds and photopolymerization initiators. This composite formulation synergistically enhances both the mold releasing force reduction effect and the curing speed, resolving the contradiction between force reduction and productivity.
2Force
If the light irradiation step is extended to generate gas, then the mold releasing force is reduced, but the manufacturing time increases and productivity decreases
Solution Approach 1:
The patent optimizes the parameters of the gas generating agent, specifically the number of alkylene oxide chains (1-6 chains) and the ratio of gas generating groups to chain length. This parameter optimization enables rapid gas generation during light irradiation, reducing both the irradiation time and the mold releasing force simultaneously.
Solution Approach 2:
The photosensitive gas generating agent is pre-incorporated into the photocurable composition in optimal concentrations and configurations. This preliminary preparation ensures that when light irradiation begins, gas generation occurs immediately and rapidly at the mold interface, eliminating the need for extended irradiation times.
3Force
If photosensitive gas generating agent is added to reduce mold releasing force, then the mold releasing force decreases, but phase separation occurs and manufacturing precision deteriorates
Solution Approach 1:
The patent precisely controls the chemical structure parameters of the gas generating agent, limiting the alkylene oxide chain length to 1-6 chains and optimizing the concentration ratios of all components. These parameter controls prevent phase separation and ensure uniform gas distribution, maintaining high manufacturing precision while achieving mold release force reduction.
Solution Approach 2:
The gas generating agent is designed to concentrate its gas generation activity locally at the mold interface where it is most needed for release, rather than uniformly throughout the entire composition. This local quality approach prevents phase separation in the bulk material while providing targeted mold releasing force reduction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively reduces mold releasing force and improves productivity by increasing gas generation per unit area, allowing for faster light irradiation and defect-free pattern formation, even in thin films, while maintaining mechanical strength.
Implementation Method 1
a photosensitive gas generating agent which generates a gas, such as nitrogen or carbon dioxide, by a photochemical reaction
Implementation Method 2
a polymerizable compound; a photopolymerization initiator
Data Source
AI summary
A photocurable composition which decreases a mold releasing force is provided. The photocurable composition is a photocurable composition which is cured using light while being in contact with a mold having a surface in which a concavo-convex pattern is formed so as to manufacture a film having a concavo-convex pattern and which includes a polymerizable compound, a photopolymerization initiator, and a photosensitive gas generating agent having a photostimulation responsive portion. The photosensitive gas generating agent has a repeating structure containing at least one alkylene oxide chain and generates a gas from the photostimulation responsive portion by light irradiation.