Photocurable Ink Composition for Adhesion and Ion Migration

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Solution Overview

Problem

The existing photocurable inkjet inks used for forming films on electronic components are insufficient in adhesiveness to inorganic base materials and ion migration resistance, particularly in thin-film applications where ion migration can lead to short circuits.

Innovation Solution

A photocurable composition comprising a specific ratio of monofunctional acrylic monomer, polyfunctional acrylic monomer, and a hydroxyl value adjusting agent, which adjusts the hydroxyl value of the composition to 1 to 100 mgKOH/g, enhancing adhesiveness and ion migration resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If photocurable resin is used as coating agent, then surface hardness and productivity are improved, but adhesiveness to inorganic base material deteriorates

Engineering Contradiction:
Improvesurface hardnessVSAvoidadhesiveness to inorganic base material
Core Design Contradiction:
StrengthVSReliability

Solution Approach 1:

The patent uses a composite photocurable resin system combining multiple resin components (epoxy resin, polyester resin, and acrylic resin) with specific functional additives. This composite formulation achieves both high surface hardness and strong adhesiveness to inorganic substrates by synergistically combining the properties of different resin types and additives.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent optimizes specific parameter ranges including hydroxyl value (5-100 mgKOH/g), carboxyl value (5-50 mgKOH/g), and resin composition ratios to simultaneously achieve high surface hardness and good adhesiveness. By precisely controlling these chemical parameters, the coating resolves the contradiction between hardness and adhesion.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If conventional photocurable inkjet ink is used, then productivity is improved, but ion migration resistance deteriorates

Engineering Contradiction:
Improvecuring speedVSAvoidion migration resistance
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent employs a composite resin system with epoxy resin, polyester resin, and acrylic resin combined with specific functional additives. This composite formulation provides both rapid photocuring capability and excellent ion migration resistance, resolving the contradiction between productivity and reliability in electronic component coatings.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent controls specific chemical parameters including hydroxyl value (5-100 mgKOH/g) and carboxyl value (5-50 mgKOH/g) to achieve optimal balance between curing speed and ion migration resistance. These parameter optimizations enable the coating to cure quickly while maintaining high reliability against ion migration.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves excellent adhesiveness to inorganic substrates and significant ion migration resistance, making it suitable for thin-film applications in electronic components without causing short circuits.

Implementation Method 1

a photopolymerization initiator (D) in an amount of 5 to 15 wt % relative to 100 wt % of the composition

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS12281235B2Photocurable composition, inkjet ink composition, active energy ray-curable ink composition, cured product, and electronic component
Publication Date: 2025.04.22 JNC CORP
  • US12281235B2 patent drawing
  • US12281235B2 patent drawing
  • US12281235B2 patent drawing

AI summary

A photocurable composition is capable of forming a cured product having good adhesiveness to an inorganic base material and having good ion migration resistance. The photocurable composition includes a monofunctional acrylic monomer (A) in an amount of 40 to 80 wt % relative to 100 wt % of the composition, a polyfunctional acrylic monomer (B) in an amount of 10 to 50 wt % relative to 100 wt % of the composition, and a hydroxyl value adjusting agent (C) in an amount of 0.1 to 30 wt % relative to 100 wt % of the composition, wherein the hydroxyl value of the composition is 1 to 100 mgKOH/g.