Photodiode Doping Profile Reshapes Electric Field to Suppress Dark Current

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Solution Overview

Problem

Photodiodes suffer from reduced sensitivity due to unwanted dark current, which degrades detection accuracy and image quality, especially when used in image sensors.

Innovation Solution

A photodiode device with an anti-reflection structure and a specific doping profile is designed to enhance photon reception efficiency and reduce dark current by reshaping the electric field distribution around the PN junction, using a third doped region with a higher doping concentration to minimize the depletion region's size and prevent it from contacting the anti-reflection structure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a photodiode is designed with conventional structure, then it can convert photons to electrical current, but dark current increases and sensitivity decreases

Engineering Contradiction:
Improvedetection accuracyVSAvoiddark current
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent introduces a third doped region with higher doping concentration specifically at the periphery of the second doped region, creating localized high-concentration zones that reshape the electric field distribution. This local modification reduces dark current generation at critical areas without affecting the overall photodiode structure, thereby improving detection accuracy while suppressing harmful dark current.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent modifies the doping concentration parameter by introducing a third doped region with higher doping concentration than the second doped region. This parameter change reshapes the electric field distribution and reduces the depletion region size, effectively suppressing dark current while maintaining photon-to-current conversion efficiency.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If the depletion region is enlarged to improve photon reception, then quantum efficiency increases, but dark current increases and sensitivity decreases

Engineering Contradiction:
Improvephoton-current generation efficiencyVSAvoiddetection accuracy
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The third doped region is strategically positioned at the periphery of the second doped region, creating localized high-concentration zones that reshape the electric field distribution. This local modification reduces dark current generation at critical areas without affecting the overall photodiode structure, thereby improving detection accuracy while suppressing harmful dark current.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent modifies the doping concentration parameter by introducing a third doped region with higher doping concentration than the second doped region. This parameter change reshapes the electric field distribution and reduces the depletion region size, effectively suppressing dark current while maintaining photon-to-current conversion efficiency.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution significantly reduces dark current and improves sensitivity, allowing for enhanced photon-current generation and effective operation in high-speed applications.

Implementation Method 1

Photodiodes are used in converting received photons into electrical currents

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Implementation Method 2

a specific doping profile is designed to enhance photon reception efficiency and reduce dark current by reshaping the electric field distribution around the PN junction

Methodology Applied
Scientific EffectElectric field distribution: Electric Field

Data Source

PatentUS10205037B2Photodiode device and manufacturing method thereof
Publication Date: 2019.02.12 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US10205037B2 patent drawing
  • US10205037B2 patent drawing
  • US10205037B2 patent drawing

AI summary

The present disclosure provides a photodiode device, which includes a semiconductor substrate, a well region in the semiconductor substrate of a first dopant type, a first doped region of the first dopant type in the well region, and a second doped region of a second dopant type disposed in the well region and over the first doped region. The second doped region comprises first recesses exposed through a surface of the second doped region, and a first portion of the second doped region on the surface comprises a first doping concentration of the second dopant type greater than a second doping concentration of a second portion of the second doped region away from the first recesses.