Photodiode Superlattice Intermediate Layer Dark Current Reduction

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Solution Overview

Problem

Infrared image sensors operating at higher temperatures experience increased dark current, which affects their performance, and existing solutions like current blocking layers are not sufficient to mitigate this issue effectively.

Innovation Solution

A photodiode design incorporating a light absorbing layer with a first superlattice structure sensitive to infrared light, an intermediate layer with a conduction band energy level lower than the p-type semiconductor region, and a p-type semiconductor region, which traps electrons and reduces dark current by creating a well potential that prevents electrons from reaching the n-side electrode.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If the operating temperature of the infrared image sensor is increased, then the operational versatility and reduced cooling requirements are improved, but the dark current increases and performance deteriorates

Engineering Contradiction:
Improveoperating temperatureVSAvoidsensor performance
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

An intermediate layer is introduced between the p-type semiconductor region and the light absorbing layer. This intermediate layer acts as a mediator with a conduction band energy level positioned between the p-type region and the light absorbing layer, creating a potential barrier that blocks electron flow while allowing hole transport, thus reducing dark current at elevated temperatures

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-generated harmful factors

If a current blocking layer is added to reduce dark current, then the dark current is reduced, but the device complexity increases

Engineering Contradiction:
Improvedark currentVSAvoidstructure complexity
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The intermediate layer utilizes changes in band energy levels (conduction band positioning) to achieve electron blocking. By carefully selecting the conduction band energy level of the intermediate layer to be between the p-type region and light absorbing layer, the structure achieves dark current reduction through parameter optimization rather than complex multi-layer configurations

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed photodiode structure effectively reduces dark current, enabling operation at higher temperatures while maintaining sensitivity, as demonstrated by its performance in temperatures up to 190 Kelvin without the need for extensive cooling.

Implementation Method 1

the intermediate layer having a conduction band having a bottom energy level lower than that of the p-type semiconductor region... traps electrons flowing in the direction from the p-type semiconductor region to the light absorbing layer

Methodology Applied
Scientific EffectWell potential: Potential Well

Implementation Method 2

a light absorbing layer including a first superlattice structure that includes first semiconductor layers and second semiconductor layers, the first superlattice structure having a band structure sensitive to infrared light

Methodology Applied
Scientific EffectInfrared absorption: Absorption (EM radiation)

Data Source

PatentUS9941431B2Photodiode having a superlattice structure
Publication Date: 2018.04.10 SUMITOMO ELECTRIC INDUSTRIES LTD
  • US9941431B2 patent drawing
  • US9941431B2 patent drawing
  • US9941431B2 patent drawing

AI summary

A photodiode includes a light absorbing layer including a first superlattice structure that includes first semiconductor layers and second semiconductor layers, the first superlattice structure having a band structure sensitive to infrared light; a p-type semiconductor region; and an intermediate layer disposed between the p-type semiconductor region and the light absorbing layer, the intermediate layer having a conduction band having a bottom energy level lower than that of the p-type semiconductor region.